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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 5, Iss. 12 — Dec. 10, 2007
  • pp: 703–705

Fabrication of SiO2 microdisk optical resonator

Wei Wei, Xiaowei Wu, Shaojun Fu, Yong Wang, Yuanji Pei, Yunfeng Xiao, and Zhengfu Han  »View Author Affiliations


Chinese Optics Letters, Vol. 5, Issue 12, pp. 703-705 (2007)


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Abstract

The silica microdisk optical resonator which exhibits whispering-gallery-type modes with quality factors of 9.67*10^(4) is fabricated with photolithographic techniques. Reactive ion beam etching (RIBE) is used to get the silica disks with photoresist masks on SiO2/Si made by standard ultraviolet (UV) photolithography, and spontaneous silicon etching by XeF2 is used to fabricate the silicon micropillars. This fabrication process can control the microcavity geometry, leading to high experiment repeatability and controllable cavity modes. These characteristics are important for many applications in which the microcavity is necessary, such as the quantum gate.

© 2007 Chinese Optics Letters

OCIS Codes
(140.4780) Lasers and laser optics : Optical resonators
(230.4000) Optical devices : Microstructure fabrication
(230.5750) Optical devices : Resonators
(270.5580) Quantum optics : Quantum electrodynamics

Citation
Wei Wei, Xiaowei Wu, Shaojun Fu, Yong Wang, Yuanji Pei, Yunfeng Xiao, and Zhengfu Han, "Fabrication of SiO2 microdisk optical resonator," Chin. Opt. Lett. 5, 703-705 (2007)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-5-12-703

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