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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 5, Iss. 12 — Dec. 10, 2007
  • pp: 709–711

Field enhancement analysis of an apertureless near field scanning optical microscope probe with finite element method

Weibin Chen and Qiwen Zhan  »View Author Affiliations


Chinese Optics Letters, Vol. 5, Issue 12, pp. 709-711 (2007)


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Abstract

Plasmonic field enhancement in a fully coated dielectric near field scanning optical microscope (NSOM) probe under radial polarization illumination is analyzed using an axially symmetric three-dimensional (3D) finite element method (FEM) model. The enhancement factor strongly depends on the illumination spot size, taper angle of the probe, and the metal film thickness. The tolerance of the alignment angle is investigated. Probe designs with different metal coatings and their enhancement performance are studied as well. The nanometric spot size at the tip apex and high field enhancement of the apertureless NSOM probe have important potential application in semiconductor metrology.

© 2007 Chinese Optics Letters

OCIS Codes
(180.5810) Microscopy : Scanning microscopy
(240.6680) Optics at surfaces : Surface plasmons
(260.5430) Physical optics : Polarization

Citation
Weibin Chen and Qiwen Zhan, "Field enhancement analysis of an apertureless near field scanning optical microscope probe with finite element method," Chin. Opt. Lett. 5, 709-711 (2007)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-5-12-709


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