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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 5, Iss. 12 — Dec. 10, 2007
  • pp: 724–726

Laser-induced damage of high reflectors for Ti:sapphire laser system

Jianke Yao, Weiqiang Zeng, Zhengxiu Fan, Hongbo He, and Jianda Shao  »View Author Affiliations


Chinese Optics Letters, Vol. 5, Issue 12, pp. 724-726 (2007)


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Abstract

A broadband (~176 nm, R>98%, 'lambda'0=800 nm) and high laser-induced damage threshold (LIDT=2.4J/cm2) TiO2/HfO2/SiO2 high reflector (HR) for Ti:sapphire chirped-pulse amplification (CPA) laser system is fabricated by the electron beam evaporation. The refractive index and extinction coefficient of TiO2 and HfO2 films are calculated from single-layer films' transmittance spectra. The properties of HR are mainly determined by the high refractive index material. The high refractive index leads to wide bandwidth. A low extinction coefficient indicates low absorption and high LIDT. The possible damage mechanism of HR is discussed.

© 2007 Chinese Optics Letters

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(310.6860) Thin films : Thin films, optical properties

Citation
Jianke Yao, Weiqiang Zeng, Zhengxiu Fan, Hongbo He, and Jianda Shao, "Laser-induced damage of high reflectors for Ti:sapphire laser system," Chin. Opt. Lett. 5, 724-726 (2007)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-5-12-724

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