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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 5, Iss. S1 — May. 31, 2007
  • pp: S1–S4

Recent progress in the development of high intensity ultrashort pulse lasers at SIOM

Zhizhan Xu and Ruxin Li  »View Author Affiliations


Chinese Optics Letters, Vol. 5, Issue S1, pp. S1-S4 (2007)


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Abstract

We report the recent progress in the development of high intensity ultrashort pulse lasers at the State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics (SIOM). Based on the concept of optical parametric chirped pulse amplification (OPCPA), a 16.7 TW/120 fs laser at 1064 nm was developed. Some new nonlinear optical materials, such as quasi-phase-match crystals, were investigated as new OPCPA gain media. The investigation of broadband OPCPA near 780 nm was also carried out. On the other hand, based on the scheme of chirped pulse amplification (CPA), the Ti:sapphire laser system with a peak power of 0.89 PW and a pulse width of ~29.0 fs has been developed. The high gain amplification was achieved in a large aperture amplifier by cladding with refractive-index matched liquid doped with absorber to suppress the parasitic lasing.

© 2007 Chinese Optics Letters

OCIS Codes
(140.3280) Lasers and laser optics : Laser amplifiers
(320.7090) Ultrafast optics : Ultrafast lasers

Citation
Zhizhan Xu and Ruxin Li, "Recent progress in the development of high intensity ultrashort pulse lasers at SIOM," Chin. Opt. Lett. 5, S1-S4 (2007)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-5-S1-S1


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