This work has demonstrated that with silver superlens, the resolution of conventional optical lithography can be improved significantly. Experimental and simulative results are given to verify the facts that the resolution and the pattern fidelity are sensitive to the contact tightness between layers.
© 2008 Chinese Optics Letters
Haiyan Qin, Xuan Li, and Su Shen, "Novel optical lithography using silver superlens," Chin. Opt. Lett. 6, 149-151 (2008)