Intrinsic stresses of carbon films deposited by direct current (DC) magnetron sputtering were investigated. The bombardments of energetic particles during the growth of films were considered to be the main reason for compressive intrinsic stresses. The values of intrinsic stresses were determined by measuring the radius of curvature of substrates before and after film deposition. By varying argon pressure and target-substrate distance, energies of neutral carbon atoms impinging on the growing films were optimized to control the intrinsic stresses level. The stress evolution in carbon films as a function of film thickness was investigated and a void-related stress relief mechanism was proposed to interpret this evolution.
© 2008 Chinese Optics Letters
Liqin Liu, Zhanshan Wang, Jingtao Zhu, Zhong Zhang, Moyan Tan, Qiushi Huang, Rui Chen, Jing Xu, and Lingyan Chen, "Intrinsic stress analysis of sputtered carbon film," Chin. Opt. Lett. 6, 384-385 (2008)