Dual-dressed four-wave mixing and dressed six-wave mixing in a five-level atomic system
Chinese Optics Letters, Vol. 6, Issue 9, pp. 685-688 (2008)
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Abstract
We study the co-existing four-wave mixing (FWM) process with two dressing fields and the six-wave mixing (SWM) process with one dressing field in a five-level system with carefully arranged laser beams. We also show two kinds of doubly dressing mechanisms in the FWM process. FWM and SWM signals propagating along the same direction compete with each other. With the properly controlled dressing fields, the FWM signals can be suppressed, while the SWM signals have been enhanced.
© 2008 Chinese Optics Letters
OCIS Codes
(030.1670) Coherence and statistical optics : Coherent optical effects
(190.4380) Nonlinear optics : Nonlinear optics, four-wave mixing
(270.4180) Quantum optics : Multiphoton processes
(300.2570) Spectroscopy : Four-wave mixing
(320.7110) Ultrafast optics : Ultrafast nonlinear optics
Citation
Cuicui Zuo, Yigang Du, Tong Jiang, Zhiqiang Nie, Yanpeng Zhang, Huaibin Zheng, Chenli Gan, Weifeng Zhang, and Keqing Lu, "Dual-dressed four-wave mixing and dressed six-wave mixing in a five-level atomic system," Chin. Opt. Lett. 6, 685-688 (2008)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-6-9-685
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