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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 7, Iss. 4 — Apr. 1, 2009
  • pp: 325–328

Deep silicon grating as high-extinction-ratio polarizing beam splitter

Jijun Feng, Changhe Zhou, Bo Wang, and Jiangjun Zheng  »View Author Affiliations


Chinese Optics Letters, Vol. 7, Issue 4, pp. 325-328 (2009)


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Abstract

A deep binary silicon grating as high-extinction-ratio reflective polarizing beam splitter (PBS) at the wavelength of 1550 nm is presented. The design is based on the phenomenon of total internal reflection (TIR) by using the rigorous coupled wave analysis (RCWA). The extinction ratio of the rectangular PBS grating can reach 2.5\times10^5 with the optimum grating period of 397 nm and groove depth of 1.092 \mum. The efficiencies of TM-polarized wave in the 0th order and TE-polarized wave in the -1st order can both reach unity at the Littrow angle. Holographic recording technology and inductively coupled plasma (ICP) etching could be used to fabricate the silicon PBS grating.

© 2009 Chinese Optics Letters

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(060.4510) Fiber optics and optical communications : Optical communications
(230.1360) Optical devices : Beam splitters
(230.5440) Optical devices : Polarization-selective devices

Citation
Jijun Feng, Changhe Zhou, Bo Wang, and Jiangjun Zheng, "Deep silicon grating as high-extinction-ratio polarizing beam splitter," Chin. Opt. Lett. 7, 325-328 (2009)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-7-4-325

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