The performances of HfO2/SiO2 single- and multi-layer coatings in vacuum influenced by contamination are studied. The surface morphology, the transmittance spectrum, and the laser-induced damage threshold are investigated. The results show that the contamination in vacuum mainly comes from the vacuum system and the contamination process is different for the HfO2 and SiO2 films. The laser-induced damage experiments at 1064 nm in vacuum show that the damage resistance of the coatings will decrease largely due to the organic contamination.
© 2009 Chinese Optics Letters
Ping Ma, Feng Pan, Songlin Chen, Zhen Wang, Jianping Hu, Qinghua Zhang, and Jianda Shao, "Contamination process and laser-induced damage of HfO2/SiO2 coatings in vacuum," Chin. Opt. Lett. 7, 643-645 (2009)