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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 7, Iss. 7 — Jul. 1, 2009
  • pp: 643–645

Contamination process and laser-induced damage of HfO2/SiO2 coatings in vacuum

Ping Ma, Feng Pan, Songlin Chen, Zhen Wang, Jianping Hu, Qinghua Zhang, and Jianda Shao  »View Author Affiliations


Chinese Optics Letters, Vol. 7, Issue 7, pp. 643-645 (2009)


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Abstract

The performances of HfO2/SiO2 single- and multi-layer coatings in vacuum influenced by contamination are studied. The surface morphology, the transmittance spectrum, and the laser-induced damage threshold are investigated. The results show that the contamination in vacuum mainly comes from the vacuum system and the contamination process is different for the HfO2 and SiO2 films. The laser-induced damage experiments at 1064 nm in vacuum show that the damage resistance of the coatings will decrease largely due to the organic contamination.

© 2009 Chinese Optics Letters

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(310.4925) Thin films : Other properties (stress, chemical, etc.)

Citation
Ping Ma, Feng Pan, Songlin Chen, Zhen Wang, Jianping Hu, Qinghua Zhang, and Jianda Shao, "Contamination process and laser-induced damage of HfO2/SiO2 coatings in vacuum," Chin. Opt. Lett. 7, 643-645 (2009)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-7-7-643

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