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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 7, Iss. 7 — Jul. 1, 2009
  • pp: 650–652

Investigation of ultrafast electron dynamics of nickel film and micro-nano-structure film

Weifeng Jin, Ming Zhou, Changlong Liu, Hui Wang, Huixia Liu, and Naifei Ren  »View Author Affiliations


Chinese Optics Letters, Vol. 7, Issue 7, pp. 650-652 (2009)


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Abstract

The electron thermalization and relaxation processes in ferromagnetic nickel thin film and micro-nano-structure film have been studied by measuring the transient change after excitation by a femtosecond laser pulse. The measurements indicate that the electron thermalization time is between 18 and 47 fs. This is somewhat faster than the value reported before. And the thermalization time of the micro-nano-structure film is much longer than the nickel film. We deduce that it is caused by the discontinuity of the electron band close to the Fermi level in the micro-nano-structure nickel film.

© 2009 Chinese Optics Letters

OCIS Codes
(240.0310) Optics at surfaces : Thin films
(240.6648) Optics at surfaces : Surface dynamics

Citation
Weifeng Jin, Ming Zhou, Changlong Liu, Hui Wang, Huixia Liu, and Naifei Ren, "Investigation of ultrafast electron dynamics of nickel film and micro-nano-structure film," Chin. Opt. Lett. 7, 650-652 (2009)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-7-7-650

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