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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 7, Iss. 9 — Sep. 1, 2009
  • pp: 865–868

Plasma channel formed by ultraviolet laser pulses at 193 nm in air

Yuanyuan Ma, Xin Lu, Tingting Xi, Qihuang Gong, and Jie Zhang  »View Author Affiliations


Chinese Optics Letters, Vol. 7, Issue 9, pp. 865-868 (2009)


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Abstract

The propagation of picosecond deep ultraviolet laser pulse at wavelength of 193 nm in air is numerically investigated. Long plasma channel can be formed due to the competition between Kerr self-focusing and ionization induced defocusing. The plasma channel with electron density of above 10<sup>13</sup>/cm<sup>3</sup> can be formed over 70 m by 50-ps, 20-mJ laser pulses. The fluctuation of laser intensity and electron density inside ultraviolet (UV) plasma channel is significantly lower than that of infrared pulse. The linear absorption of UV laser by air is considered in the simulation and it is shown that the linear absorption is important for the limit of the length of plasma channel.

© 2009 Chinese Optics Letters

OCIS Codes
(320.5550) Ultrafast optics : Pulses
(320.7090) Ultrafast optics : Ultrafast lasers
(320.7110) Ultrafast optics : Ultrafast nonlinear optics

Citation
Yuanyuan Ma, Xin Lu, Tingting Xi, Qihuang Gong, and Jie Zhang, "Plasma channel formed by ultraviolet laser pulses at 193 nm in air," Chin. Opt. Lett. 7, 865-868 (2009)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-7-9-865

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