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Chinese Optics Letters

Chinese Optics Letters


  • Vol. 8, Iss. 1 — Jan. 1, 2010
  • pp: 41–44

Damage characteristics of HfO2/SiO2 high reflector at 45° incidence in 1-on-1 and N-on-1 tests

Xiaofeng Liu, Dawei Li, Yuan'an Zhao, Xiao Li, Xiulan Ling, and Jianda Shao  »View Author Affiliations

Chinese Optics Letters, Vol. 8, Issue 1, pp. 41-44 (2010)

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P-polarization high reflectors are deposited by e-beam from hafnia and silica. 1-on-1 and N-on-1 tests at 1064-nm wavelength with P-polarization at 45° incidence are carried out on these samples. Microscope and scanning electron microscope are applied to investigate the damage morphologies in both 1-on-1 and N-on-1 tests. It is found that the laser damage threshold is higher in N-on-1 tests and nodular defect is the main inducement that leads to the damage because nodular ejection with plasma scalding is the typical damage morphology. Similar damage morphology observed in the two tests indicates that the higher laser damage threshold in N-on-1 test is attributed to the mechanical stabilization process of nodular defects, owing to the gradually increased laser fluence radiation. Based on the typical morphology study, some process optimizations are given.

© 2010 Chinese Optics Letters

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(310.0310) Thin films : Thin films

Xiaofeng Liu, Dawei Li, Yuan'an Zhao, Xiao Li, Xiulan Ling, and Jianda Shao, "Damage characteristics of HfO2/SiO2 high reflector at 45° incidence in 1-on-1 and N-on-1 tests," Chin. Opt. Lett. 8, 41-44 (2010)

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