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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 8, Iss. 1 — Jan. 1, 2010
  • pp: 41–44

Damage characteristics of HfO2/SiO2 high reflector at 45° incidence in 1-on-1 and N-on-1 tests

Xiaofeng Liu, Dawei Li, Yuan'an Zhao, Xiao Li, Xiulan Ling, and Jianda Shao  »View Author Affiliations


Chinese Optics Letters, Vol. 8, Issue 1, pp. 41-44 (2010)


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Abstract

P-polarization high reflectors are deposited by e-beam from hafnia and silica. 1-on-1 and N-on-1 tests at 1064-nm wavelength with P-polarization at 45° incidence are carried out on these samples. Microscope and scanning electron microscope are applied to investigate the damage morphologies in both 1-on-1 and N-on-1 tests. It is found that the laser damage threshold is higher in N-on-1 tests and nodular defect is the main inducement that leads to the damage because nodular ejection with plasma scalding is the typical damage morphology. Similar damage morphology observed in the two tests indicates that the higher laser damage threshold in N-on-1 test is attributed to the mechanical stabilization process of nodular defects, owing to the gradually increased laser fluence radiation. Based on the typical morphology study, some process optimizations are given.

© 2010 Chinese Optics Letters

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(310.0310) Thin films : Thin films

Citation
Xiaofeng Liu, Dawei Li, Yuan'an Zhao, Xiao Li, Xiulan Ling, and Jianda Shao, "Damage characteristics of HfO2/SiO2 high reflector at 45° incidence in 1-on-1 and N-on-1 tests," Chin. Opt. Lett. 8, 41-44 (2010)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-8-1-41


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References

  1. D. Li, Y. Zhao, J. Shao, Z. Fan, and H. He, Chin. Opt. Lett. 6, 386 (2008).
  2. C. Xu, H. Dong, J. Ma, Y. Jin, J. Shao, and Z. Fan, Chin. Opt. Lett. 6, 228 (2008).
  3. X. Liu, D. Li, X. Li, Y. Zhao, and J. Shao, Chinese J. Lasers (in Chinese) 36, 1 (2009).
  4. S. C. Weakley, C. J. Stolz, Z. Wu, R. P. Bevis, and M. K. von Gunten, Proc. SPIE 3578, 137 (1999).
  5. F. Y. Génin and C. J. Stolz, Proc. SPIE 2870, 439 (1996).
  6. C. R. Wolfe, M. R. Kozlowski, J. H. Campbell, F. Rainer, A. J. Morgan, and R. P. Gonzales, Proc. SPIE 1438, 360 (1989).
  7. M. R. Kozlowski, C. R. Wolfe, M. C. Staggs, and J. H. Campbell, Proc. SPIE 1438, 376 (1989).
  8. M. R. Kozlowski, M. Staggs, F. Rainer, and J. H. Stathis, Proc. SPIE 1441, 269 (1991).
  9. M. C. Staggs, M. Baloch, M. R. Kozlowski, and W. J. Siekhaus, Proc. SPIE 1624, 375 (1992).
  10. Z. L. WU, Z. X. Fan, and D. Schater, Proc. SPIE 1624, 362 (1992).
  11. L. Sheehan, M. Kozlowski, F. Rainer, and M. Staggs, Proc. SPIE 2114, 559 (1994).
  12. Q. Zhao, H. Qiu, Y. Liu, Z. Fan, and Z. Wang, Acta Opt. Sin. (in Chinese) 19, 1105 (1999).
  13. Y. Zhao, T. Wang, D. Zhang, S. Fan, J. Shao, and S. Fan, Appl. Surf. Sci. 239, 171 (2005).
  14. J. Capoulade, L. Gallais, J.-Y. Natoli, and M. Commandré, Appl. Opt. 47, 5272 (2008).
  15. J. Murphy, Proc. SPIE 246, 64 (1980).
  16. C. J. Stolz, F. Y. Genin, and T. V. Pistor, Proc. SPIE 5273, 41 (2004).
  17. R. H. Sawicki, C. C. Shang, and T. L. Swatloski, Proc. SPIE 2428, 333 (1995).
  18. M. R. Kozlowski, M. Staggs, M. Balooch, R. Tench, and W. Siekhaus, Proc. SPIE 1556, 68 (1991).
  19. A. Fornier, C. Cordillot, D. Ausserre, and F. Paris, Proc. SPIE 2253, 817 (1994).
  20. A. B. Papandrew, C. J. Stolz, Z. L. Wu, G. E. Loomisa, and S. Falabella, Proc. SPIE 4347, 53 (2001).

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