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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 8, Iss. 11 — Nov. 1, 2010
  • pp: 1082–1084

All-reflective optical system design for extreme ultraviolet lithography

Jun Chang, Meifang Zou, Ruirui Wang, Shulong Feng, and M. M. Talha  »View Author Affiliations


Chinese Optics Letters, Vol. 8, Issue 11, pp. 1082-1084 (2010)


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Abstract

All-reflective optical systems, due to their material absorption and low refractive index, are used to create the most suitable devices in extreme ultraviolet lithography (EUVL). In this letter, we present a design for an all-reflective lithographic projection lens. We also discuss its design idea and structural system. After analysis of the four-mirror optical system, the initial structural parameters are determined, the optical system is optimized, and the tolerances of the system are analyzed. We also show the implementation of optimal layout and desired imaging performance.

© 2010 Chinese Optics Letters

OCIS Codes
(110.4100) Imaging systems : Modulation transfer function
(220.1250) Optical design and fabrication : Aspherics
(220.4830) Optical design and fabrication : Systems design

Citation
Jun Chang, Meifang Zou, Ruirui Wang, Shulong Feng, and M. M. Talha, "All-reflective optical system design for extreme ultraviolet lithography," Chin. Opt. Lett. 8, 1082-1084 (2010)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-8-11-1082

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