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Chinese Optics Letters

Chinese Optics Letters


  • Vol. 8, Iss. 11 — Nov. 1, 2010
  • pp: 1082–1084

All-reflective optical system design for extreme ultraviolet lithography

Jun Chang, Meifang Zou, Ruirui Wang, Shulong Feng, and M. M. Talha  »View Author Affiliations

Chinese Optics Letters, Vol. 8, Issue 11, pp. 1082-1084 (2010)

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All-reflective optical systems, due to their material absorption and low refractive index, are used to create the most suitable devices in extreme ultraviolet lithography (EUVL). In this letter, we present a design for an all-reflective lithographic projection lens. We also discuss its design idea and structural system. After analysis of the four-mirror optical system, the initial structural parameters are determined, the optical system is optimized, and the tolerances of the system are analyzed. We also show the implementation of optimal layout and desired imaging performance.

© 2010 Chinese Optics Letters

OCIS Codes
(110.4100) Imaging systems : Modulation transfer function
(220.1250) Optical design and fabrication : Aspherics
(220.4830) Optical design and fabrication : Systems design

Jun Chang, Meifang Zou, Ruirui Wang, Shulong Feng, and M. M. Talha, "All-reflective optical system design for extreme ultraviolet lithography," Chin. Opt. Lett. 8, 1082-1084 (2010)

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  1. L. Qiu, Microfabrication Technology (in Chinese) (2) 1(2003).
  2. K. Murakami, T. Oshino, H. Kondo, H. Chiba, H. Komatsuda, K. Nomura, and H. Iwata, Proc. SPIE 6517, 65170J (2007).
  3. K. Kemp and S. Wurm, C. R. Physique 7, 875 (2006).
  4. K. Murakami, T. Oshino, H. Kondo, H. Chiba, K. Nomura, H. Kawai, Y. Kohama, K. Morita, K. Hada, Y. Ohkubo, and T. Miura, Proc. SPIE 7140, 71401C (2008).
  5. R. Jonckheere, G. F. Lorusso, A. M. Goethals, J. Hermans, B. Baudemprez, A. Myers, I. Kim, A. Niroomand, F. Iwamoto, N. Stepanenko, and K. Ronse, Proc. SPIE 6607, 66070H (2007).
  6. H. Qin, X. Li, and S. Shen, Chin. Opt. Lett. 6, 149 (2008).
  7. X. Wang, J. He, X. Pei, P. Shao, J. Chu, and W. Huang, Chin. Opt. Lett. 7, 724 (2009).
  8. Z. Wang, J. Zhu, Z. Zhang, B. Mu, F. Wang, X. Cheng, F. Wang, and L. Chen, Chin. Opt. Lett. 8, 163 (2010).
  9. J. H. Bruning, Proc. SPIE 6520, 652004 (2007).
  10. J. Chang, Z. Weng, H. Jiang, X. Zhang, and X. Cong, Acta Opt. Sin. (in Chinese) 23, 216 (2003).

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