A novel direct writing technique using submicron-diameter fibers is presented. This technique adopts contact mode in the process of writing, and submicron lines with different widths have been obtained. Experimental results demonstrate that the resolution of this technique can be smaller than the exposure wavelength of 442 nm, and 380-nm-wide line is achieved. In addition, the distribution of light fields in the photoresist layer is analyzed by finite-difference time-domain method.
© 2010 Chinese Optics Letters
(140.3510) Lasers and laser optics : Lasers, fiber
(110.4235) Imaging systems : Nanolithography
(220.4241) Optical design and fabrication : Nanostructure fabrication
(310.6628) Thin films : Subwavelength structures, nanostructures
Feng Tian, Guoguang Yang, Jian Bai, Qiaofen Zhou, Changlun Hou, Jianfeng Xu, and Yiyong Liang, "Subwavelength-resolution direct writing using submicron-diameter fibers," Chin. Opt. Lett. 8, 326-328 (2010)