The influence of laser conditioning on defects of HfO2 monolayer films prepared by electron beam evaporation (EBE) is investigated utilizing the spot-size effect of the laser-induced damage. It is found that the laser-induced damage threshold of HfO2 monolayer films can be increased by a factor of 1.3-1.6. It is also found that the defects with low threshold can be removed by laser conditioning and defects with higher threshold may be removed partially.
© 2010 Chinese Optics Letters
Xiao Li, Yuan'an Zhao, Xiaofeng Liu, Jianda Shao, and Zhengxiu Fan, "Influence of laser conditioning on defects of HfO2 monolayer films," Chin. Opt. Lett. 8, 615-617 (2010)