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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 8, Iss. 6 — Jun. 1, 2010
  • pp: 615–617

Influence of laser conditioning on defects of HfO2 monolayer films

Xiao Li, Yuan'an Zhao, Xiaofeng Liu, Jianda Shao, and Zhengxiu Fan  »View Author Affiliations


Chinese Optics Letters, Vol. 8, Issue 6, pp. 615-617 (2010)


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Abstract

The influence of laser conditioning on defects of HfO2 monolayer films prepared by electron beam evaporation (EBE) is investigated utilizing the spot-size effect of the laser-induced damage. It is found that the laser-induced damage threshold of HfO2 monolayer films can be increased by a factor of 1.3-1.6. It is also found that the defects with low threshold can be removed by laser conditioning and defects with higher threshold may be removed partially.

© 2010 Chinese Optics Letters

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(310.6870) Thin films : Thin films, other properties

Citation
Xiao Li, Yuan'an Zhao, Xiaofeng Liu, Jianda Shao, and Zhengxiu Fan, "Influence of laser conditioning on defects of HfO2 monolayer films," Chin. Opt. Lett. 8, 615-617 (2010)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-8-6-615

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