Abstract
Aperiodic molybdenum/silicon (Mo/Si) multilayer designed as a broadband
reflective mirror with mean reflectivity of 10% over a wide wavelength range of
12.5-28.5 nm at incidence angle of 5? is developed using a numerical optimized
method. The multilayer is prepared using direct current magnetron sputtering
technology. The reflectivity is measured using synchrotron radiation. The measured
mean reflectivity is 7.0% in the design wavelength range of 12.5-28.5 nm. This
multilayer broadband reflective mirror can be used in extreme ultraviolet
measurements and will greatly simplify the experimental arrangements.
© 2011 Chinese Optics Letters
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