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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 9, Iss. 2 — Feb. 10, 2011
  • pp: 023102–

Mo/Si aperiodic multilayer broadband reflective mirror for 12.5-28.5-nm wavelength range

Moyan Tan, Haochuan Li, Qiushi Huang, Hongjun Zhou, Tonglin Huo, Xiaoqiang Wang, and Jingtao Zhu  »View Author Affiliations


Chinese Optics Letters, Vol. 9, Issue 2, pp. 023102- (2011)


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Abstract

Aperiodic molybdenum/silicon (Mo/Si) multilayer designed as a broadband reflective mirror with mean reflectivity of 10% over a wide wavelength range of 12.5-28.5 nm at incidence angle of 5? is developed using a numerical optimized method. The multilayer is prepared using direct current magnetron sputtering technology. The reflectivity is measured using synchrotron radiation. The measured mean reflectivity is 7.0% in the design wavelength range of 12.5-28.5 nm. This multilayer broadband reflective mirror can be used in extreme ultraviolet measurements and will greatly simplify the experimental arrangements.

© 2011 Chinese Optics Letters

OCIS Codes
(230.4170) Optical devices : Multilayers
(310.1860) Thin films : Deposition and fabrication
(340.6720) X-ray optics : Synchrotron radiation
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)

Citation
Moyan Tan, Haochuan Li, Qiushi Huang, Hongjun Zhou, Tonglin Huo, Xiaoqiang Wang, and Jingtao Zhu, "Mo/Si aperiodic multilayer broadband reflective mirror for 12.5-28.5-nm wavelength range," Chin. Opt. Lett. 9, 023102- (2011)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-9-2-023102

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