Aperiodic molybdenum/silicon (Mo/Si) multilayer designed as a broadband reflective mirror with mean reflectivity of 10% over a wide wavelength range of 12.5-28.5 nm at incidence angle of 5? is developed using a numerical optimized method. The multilayer is prepared using direct current magnetron sputtering technology. The reflectivity is measured using synchrotron radiation. The measured mean reflectivity is 7.0% in the design wavelength range of 12.5-28.5 nm. This multilayer broadband reflective mirror can be used in extreme ultraviolet measurements and will greatly simplify the experimental arrangements.
© 2011 Chinese Optics Letters
(230.4170) Optical devices : Multilayers
(310.1860) Thin films : Deposition and fabrication
(340.6720) X-ray optics : Synchrotron radiation
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
Moyan Tan, Haochuan Li, Qiushi Huang, Hongjun Zhou, Tonglin Huo, Xiaoqiang Wang, and Jingtao Zhu, "Mo/Si aperiodic multilayer broadband reflective mirror for 12.5-28.5-nm wavelength range," Chin. Opt. Lett. 9, 023102- (2011)