Abstract
Wolter I collector is the best collector for extreme ultraviolet (EUV)
lithography, which has a series of nested mirrors. It has high collection efficiency
and can obtain more uniform intensity distribution at the intermediate focus (IF). A
new design with the calculation sequence from the outer mirror to the inner one on
the premise of satisfying the requirements of the collector is introduced. Based on
this concept, a computer program is established and the optical parameters of the
collector using the program is calculated. The design results indicate that the
collector satisfies all the requirements.
© 2011 Chinese Optics Letters
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