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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 9, Iss. 6 — Jun. 10, 2011
  • pp: 061405–

Localized CO2 laser treatment and post-heating process to reduce the growth coefficient of fused silica surface damage

Shizhen Xu, Xiaotao Zu, and Xiaodong Yuan  »View Author Affiliations


Chinese Optics Letters, Vol. 9, Issue 6, pp. 061405- (2011)


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Abstract

The lifetime of optical components in high-fluence ultraviolet (UV) laser applications is typically limited by laser-initiated damage and its subsequent growth. Using 10.6-μm CO2 laser pulses, we successfully mitigate 355-nm laser induced damage sites on fused silica surface with dimensions less than 200 μm. The damage threshold increases and the damage growth mitigates. However, the growth coefficients of new damage on the CO2 laser processed area are higher than those of the original sample. The damage grows with crack propagation for residual stress after CO2 laser irradiation. Furthermore, post-heating is beneficial to the release of residual stress and slows down the damage growth.

© 2011 Chinese Optics Letters

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(140.3390) Lasers and laser optics : Laser materials processing
(140.3470) Lasers and laser optics : Lasers, carbon dioxide
(160.6030) Materials : Silica

Citation
Shizhen Xu, Xiaotao Zu, and Xiaodong Yuan, "Localized CO2 laser treatment and post-heating process to reduce the growth coefficient of fused silica surface damage," Chin. Opt. Lett. 9, 061405- (2011)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-9-6-061405

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