OSA's Digital Library

Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 9, Iss. 9 — Sep. 10, 2011
  • pp: 093201–

Femtosecond laser ablation of silicon in air and vacuum

Zehua Wu, Nan Zhang, Mingwei Wang, and Xiaonong Zhu  »View Author Affiliations


Chinese Optics Letters, Vol. 9, Issue 9, pp. 093201- (2011)


View Full Text Article

Acrobat PDF (1389 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations
  • Export Citation/Save Click for help

Abstract

Femtosecond (fs) pulse laser ablation of silicon targets in air and in vacuum is investigated using a time-resolved shadowgraphic method. The observed dynamic process of the fs laser ablation of silicon in air is significantly different from that in vacuum. Similar to the ablation of metallic targets, while the shock wave front and a series of nearly concentric and semicircular stripes, as well as the contact front, are clearly identifiable in the process of ablation under 1?105 Pa, these phenomena are no longer observed when the ablation takes place in vacuum. Although the ambient air around the target strongly affects the evolution of the ablation plume, the three rounds of material ejection clearly observed in the shadowgraphs of fs laser ablation in standard air can also be distinguished in the process of ablation in vacuum. It is proven that the three rounds of material ejection are caused by different ablation mechanisms.

© 2011 Chinese Optics Letters

OCIS Codes
(140.7090) Lasers and laser optics : Ultrafast lasers
(320.7120) Ultrafast optics : Ultrafast phenomena
(320.7130) Ultrafast optics : Ultrafast processes in condensed matter, including semiconductors

Citation
Zehua Wu, Nan Zhang, Mingwei Wang, and Xiaonong Zhu, "Femtosecond laser ablation of silicon in air and vacuum," Chin. Opt. Lett. 9, 093201- (2011)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-9-9-093201


Sort:  Author  |  Year  |  Journal  |  Reset

References

  1. B. N. Chichkov, C. Momma, S. Nolte, F. von Alvensleben, and A. T?unnermann, Appl. Phys. A 63, 109 (1996).
  2. Y. Wu, C. Wang, W. Jia, X. Ni, M. Hu, and L. Chai, Chin. Opt. Lett. 6, 51 (2008).
  3. Y. Li, H. Jiang, H. Yang, and Q. Gong, Chin. Opt. Lett. 3, (suppl.) 200 (2008).
  4. Y. Zhu, H. Mei, T. Zhu, J. Zhang, and S. Yin, Chin. Opt. Lett. 7, 675 (2009).
  5. W. Jia, B. Zhou, X. Li, L. Chai, R. Zhang, and C. Wang, Chin. Opt. Lett. 8, 38 (2010).
  6. Y. Zhang, X. Jia, P. Xiong, and T. Jia, Chin. Opt. Lett. 8, 1203 (2010).
  7. E. Stratakis, M. Barberoglou, C. Fotakis, G. Viau, C. Garcia, and G. A. Shafeev, Opt. Express 17, 12650 (2009).
  8. A. S. Mahmood, M. Sivakumar, K. Venkatakrishnan, and B. Tan, Appl. Phys. Lett. 95, 034107 (2009).
  9. J. Perri?ere, E. Millon, W. Seiler, C. Boulmer-Leborgne, V. Craciun, O. Albert, J. C. Loulergue, and J. Etchepare, J. Appl. Phys. 91, 690 (2002).
  10. S. Amoruso, R. Bruzzese, N. Spinelli, R. Velotta, M. Vitiello, X. Wang, G. Ausanio, V. Iannotti, and L. Lanotte, Appl. Phys. Lett. 84, 4502 (2004).
  11. S. Amoruso, R. Bruzzese, X. Wang, and J. Xia, Appl. Phys. Lett. 92, 041503 (2008).
  12. M. Lenner, A. Kaplan, Ch. Huchon, and R. E. Palmer, Phys. Rev. B 79, 184105 (2009).
  13. K. Oguri, Y. Okano, T. Nishikawa, and H. Nakano, Phys. Rev. B 79, 144106 (2009).
  14. N. Zhang, X. Zhu, J. Yang, X. Wang, and M. Wang, Phys. Rev. Lett. 99, 167602 (2007).
  15. X. Mao, S. S. Mao, and R. E. Russo, Appl. Phys. Lett. 82, 697 (2003).
  16. X. Wang, T. Jia, X. Li, C. Li, D. Feng, H. Sun, S. Xu, and Z. Xu, Chin. Opt. Lett. 3, 615 (2005).
  17. T. Wu, C. Zhou, E. Dai, and J. Xie, Chin. Opt. Lett. 7, 653 (2009).
  18. C. T. Hebeisen, G. Sciaini, M. Harb, R. Ernstorfer, S. G. Kruglik, and R. J. D. Miller, Phys. Rev. B 78, 081403 (R) (2008).
  19. D. Perez and L. J. Lewis, Phys. Rev. B 67, 184102 (2003).
  20. X. Liu and Y. Wang, Chin. Opt. Lett. 3, 57 (2005).
  21. W. G. Roeterdink, L. B. F. Juurlink, O. P. H. Vaughan, J. Dura Diez, M. Bonn, and A. W. Kleyn, Appl. Phys. Lett. 82, 4190 (2003).
  22. P. Lorazo, L. J. Lewis, and M. Meunier, Phys. Rev. Lett. 91, 225502 (2003).
  23. F. Vidal, T. W. Johnston, S. Laville, O. Barth?elemy, M. Chaker, B. Le Drogoff, J. Margot, and M. Sabsabi, Phys. Rev. Lett. 86, 2573 (2001).
  24. D. Perez and L. J. Lewis, Phys. Rev. Lett. 89, 255504 (2002).
  25. X. Wang and X. Xu, J. Thermal Stresses, 25, 457 (2002).
  26. Z. Wu, X. Zhu, and N. Zhang, J. Appl. Phys. 109, 053113 (2011).
  27. G. Callies, P. Berger, and H. Hugel, J. Phys. D 28, 794 (1995).
  28. E. G. Gamaly, S. Juodkazis, K. Nishimura, H. Misawa, B. L. Davies, L. Hallo, P. Nicolai, and V. T. Tikhonchuk, Phys. Rev. B 73, 214101 (2006).
  29. C. Cheng and X. Xu, Phys. Rev. B 67, 165415 (2005).

Cited By

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited