The Influence of Channel Compositions on the Electrical Properties of Solution-Processed Indium-Zinc Oxide Thin-Film Transistors
Journal of Display Technology, Vol. 5, Issue 12, pp. 509-514 (2009)
Acrobat PDF (875 KB)
Abstract
Electrical properties of indium-zinc oxide (IZO) thin-film-transistors (TFTs) based on solution processes with various channel compositions are investigated in this paper. Amorphous IZO thin films with high transparency and smooth/uniform surfaces are deposited by spin-coating. The In:Zn ratio is varied by adjusting the precursor compositions, and its influences on the electrical properties, such as resistivity, mobility, and threshold voltage, etc., of IZO films and TFTs are studied. The devices showed field effect mobility ranging from 0.07 to 2.13 cm2/V · s with the In component (In + Zn)) varying from 0.2 to 0.5.
© 2009 IEEE
Citation
Chang-Ken Chen, Hsing-Hung Hsieh, Jing-Jong Shyue, and Chung-Chih Wu, "The Influence of Channel Compositions on the Electrical Properties of Solution-Processed Indium-Zinc Oxide Thin-Film Transistors," J. Display Technol. 5, 509-514 (2009)
http://www.opticsinfobase.org/jdt/abstract.cfm?URI=jdt-5-12-509
You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription





OSA is a member of 