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Journal of Display Technology

Journal of Display Technology

| A JOINT IEEE/OSA PUBLICATION

  • Vol. 7, Iss. 1 — Jan. 1, 2011
  • pp: 36–39

150 °C Amorphous Silicon Thin Film Transistors With Low-Stress Nitride on Transparent Plastic

Isaac Chan, Maryam Moradi, Andrei Sazonov, and Arokia Nathan

Journal of Display Technology, Vol. 7, Issue 1, pp. 36-39 (2011)


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Abstract

This paper reports on hydrogenated amorphous silicon (a-Si:H) thin-film transistors (TFTs) processed at 150 °C using plasma-enhanced chemical vapor deposition on polyethylene naphthalate (PEN) transparent plastic substrates. We examine the impact of RF deposition power on film stress of amorphous silicon nitride (a-SiNx:H), and resulting TFT performance. Transistors with the lowest stress nitride, yield the best performance in terms of device mobility (~1.1 cm2/V · S), ON/OFF current ratio (~1010), and gate leakage current (< 0.1 pA). Stable TFTs are demonstrated with a threshold voltage shift of less than 0.8 V following 10 hours of DC bias stress at 10 V.

© 2011 IEEE

Citation
Isaac Chan, Maryam Moradi, Andrei Sazonov, and Arokia Nathan, "150 °C Amorphous Silicon Thin Film Transistors With Low-Stress Nitride on Transparent Plastic," J. Display Technol. 7, 36-39 (2011)
http://www.opticsinfobase.org/jdt/abstract.cfm?URI=jdt-7-1-36

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