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Journal of Lightwave Technology

Journal of Lightwave Technology

| A JOINT IEEE/OSA PUBLICATION

  • Vol. 18, Iss. 2 — Feb. 1, 2000
  • pp: 221–

Frequency-Dependent Characteristics of an Ion-Implanted GaAs MESFET with Opaque Gate Under Illumination

Nandita Saha Roy, B. B. Pal, and R. U. Khan

Journal of Lightwave Technology, Vol. 18, Issue 2, pp. 221- (2000)


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Abstract

Commercial metal-semiconductor-field-effect tran- sistors (MESFET's) have opaque gate. We present here the frequency-dependent characteristics of an ion-implanted GaAs MESFET with opaque gate under illumination. The incident light enters the device through the gate-source and gate-drain spacings. Two photovoltages are developed: one across the Schottky junction due to generation in the side walls of the depletion layer below the gate and the other across the channel-substrate junction due to generation in the channel-substrate depletion region. The frequency dependence of the two photovoltages along with channel charge, drain-source current, transconductance and channel conductance of the device have been studied analytically and compared with the published theoretical results. For the first time, a commercially available GaAs optically illuminated field-effect transistor (OPFET) has been analyzed for frequency-dependent characteristics instead of the transparent/semitransparent gate OPFET.

[IEEE ]

Citation
Nandita Saha Roy, B. B. Pal, and R. U. Khan, "Frequency-Dependent Characteristics of an Ion-Implanted GaAs MESFET with Opaque Gate Under Illumination," J. Lightwave Technol. 18, 221- (2000)
http://www.opticsinfobase.org/jlt/abstract.cfm?URI=jlt-18-2-221

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