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Journal of Lightwave Technology

Journal of Lightwave Technology

| A JOINT IEEE/OSA PUBLICATION

  • Vol. 16, Iss. 1 — Jan. 1, 1998
  • pp: 127–

Poly-Si/SiO2 Laminated Walk-Off Polarizer Having a Beam-Splitting Angle of More Than 20^{irc}

Kouichi Muro and Kazuo Shiraishi

Journal of Lightwave Technology, Vol. 16, Issue 1, pp. 127- (1998)


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Abstract

A spatial walk-off polarizer having a split angle of more than 20^{irc} in both the 1.3 and 1.5 m wavelength regions has been fabricated for the first time. The polarizer consists of alternate laminated layers of poly-Si and silica. The new polarizer makes the best use of the characteristics of crystal Si, namely high refractive index, and low absorption coefficients in the longer wavelength regions. A rather simplified fabrication process that utilizes the RF sputtering method is also proposed, in which only the oxygen-intake valve is used to control the deposition of poly-Si and silica layers from a single-crystal Si target. The fabricated polarizer has beam splitting angles as large as 22 and 21^{irc} at wavelengths of 1.30 and 1.55 m, respectively, being roughly four times larger than those of rutile or calcite.

[IEEE ]

Citation
Kouichi Muro and Kazuo Shiraishi, "Poly-Si/SiO2 Laminated Walk-Off Polarizer Having a Beam-Splitting Angle of More Than 20^{irc}," J. Lightwave Technol. 16, 127- (1998)
http://www.opticsinfobase.org/jlt/abstract.cfm?URI=jlt-16-1-127


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