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Journal of Lightwave Technology

Journal of Lightwave Technology


  • Vol. 17, Iss. 1 — Jan. 1, 1999
  • pp: 108–

Shape-Optimized Electrooptic Beam Scanners: Analysis, Design, and Simulation

Yi Chiu, Jie Zou, Daniel D. Stancil, and T. E. Schlesinger

Journal of Lightwave Technology, Vol. 17, Issue 1, pp. 108- (1999)

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This paper presents the analysis of a general nonrectangular electrooptic (EO) scanner and compare its performance to a rectangular device. Since the scanning sensitivity of an EO scanner is inversely proportional to its width, high sensitivity requires the device contour to be close to the ray trajectory of a beam propagating through the device. Accordingly, a shaped-optimized scanner is designed so that the beam trajectory at maximum deflection is parallel to the device contour. A beam propagation method (BPM) simulation shows the performance agrees well with the analysis.


Yi Chiu, Jie Zou, Daniel D. Stancil, and T. E. Schlesinger, "Shape-Optimized Electrooptic Beam Scanners: Analysis, Design, and Simulation," J. Lightwave Technol. 17, 108- (1999)

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  1. Q. Chen, Y. Chiu, D. N. Lambeth, T. E. Schlesinger, and D. D. Stancil, "Guided-wave electro-optic beam deflector using domain reversal in LiTaO_3," J. Lightwave Technol., vol. 12, pp. 1401-1404, Aug. 1994.
  2. Y. Chiu, R. S. Burton, D. D. Stancil, and T. E. Schlesinger, "Design and simulation of waveguide electro-optic beam deflectors," J. Lightwave Technol., vol. 13, pp. 2049-2052, Oct. 1995.

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