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Journal of Lightwave Technology

Journal of Lightwave Technology

| A JOINT IEEE/OSA PUBLICATION

  • Vol. 17, Iss. 1 — Jan. 1, 1999
  • pp: 108–

Shape-Optimized Electrooptic Beam Scanners: Analysis, Design, and Simulation

Yi Chiu, Jie Zou, Daniel D. Stancil, and T. E. Schlesinger

Journal of Lightwave Technology, Vol. 17, Issue 1, pp. 108- (1999)


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Abstract

This paper presents the analysis of a general nonrectangular electrooptic (EO) scanner and compare its performance to a rectangular device. Since the scanning sensitivity of an EO scanner is inversely proportional to its width, high sensitivity requires the device contour to be close to the ray trajectory of a beam propagating through the device. Accordingly, a shaped-optimized scanner is designed so that the beam trajectory at maximum deflection is parallel to the device contour. A beam propagation method (BPM) simulation shows the performance agrees well with the analysis.

[IEEE ]

Citation
Yi Chiu, Jie Zou, Daniel D. Stancil, and T. E. Schlesinger, "Shape-Optimized Electrooptic Beam Scanners: Analysis, Design, and Simulation," J. Lightwave Technol. 17, 108- (1999)
http://www.opticsinfobase.org/jlt/abstract.cfm?URI=jlt-17-1-108

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