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Journal of Lightwave Technology

Journal of Lightwave Technology

| A JOINT IEEE/OSA PUBLICATION

  • Vol. 20, Iss. 4 — Apr. 1, 2002
  • pp: 751–

Fabrication Tolerance Study of a Compact Passive Polarization Rotator

N. Somasiri, B. M. A. Rahman, and S. S. A. Obayya

Journal of Lightwave Technology, Vol. 20, Issue 4, pp. 751- (2002)


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Abstract

In this paper, the expected performance of a compact low-loss passive polarization rotator is reported by using rigorous numerical approaches. The effects of waveguide width, slant angle, etch depth, and refractive index variations during its fabrication on the overall polarization conversion and polarization crosstalk are reported. It is also expected that over the 1.53-to 1.61-µm wavelength range, polarization conversion would be more than 99% and polarization crosstalk would be better than -20 dB.

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Citation
N. Somasiri, B. M. A. Rahman, and S. S. A. Obayya, "Fabrication Tolerance Study of a Compact Passive Polarization Rotator," J. Lightwave Technol. 20, 751- (2002)
http://www.opticsinfobase.org/jlt/abstract.cfm?URI=jlt-20-4-751


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References

  1. R. C. Alferness and L. L. Buhl, "High-speed waveguide electro-optic polarization modulator", Opt. Lett., vol. 7, pp. 500-502, 1982.
  2. B. M. A. Rahman and J. B. Davies, "Analysis of optical waveguide discontiniuties", J. Lightwave Technol., vol. 6, pp. 52-57, Jan. 1988.

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