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Optica Publishing Group
  • Journal of Lightwave Technology
  • Vol. 20,
  • Issue 5,
  • pp. 826-
  • (2002)

The Effect of Fabrication Parameters on a Ridge Mach-Zehnder Interferometric (MZI) Modulator

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Abstract

A study of Mach-Zehnder interferometer (MZI) modulators using unetched and etched Ti: LiNbO3 waveguides has been made. A full vectorial finite-element-based mode solver was used, followed by a finite element-based solution of the Laplace equation to calculate the electrooptic effect and, subsequently, the half-wave voltage, Vπ. The optical loss due to the metal electrodes was also found using the H-field finite-element method (FEM) incorporating the perturbation method. The microwave effective index, nm, and the characteristic impedance of the metal electrodes, Zc, were also found for a number of electrode thicknesses and ridge heights. A semivectorial finite-element beam propagation method (SVFEBPM) was used to estimate the radiation loss for the curved input and output (I/O) waveguides of the MZI. The device characteristics were then studied by making changes to a number of fabrication parameters,of which the two most important were found to be the etch depth of the ridge and the thickness of the SiO2 buffer layer.

[IEEE ]

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