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Journal of Lightwave Technology

Journal of Lightwave Technology

| A JOINT IEEE/OSA PUBLICATION

  • Vol. 21, Iss. 1 — Jan. 1, 2003
  • pp: 140–

Photosensitivity and Application With 157-nm F2 Laser Radiation in Planar Lightwave Circuits

Kevin P. Chen, Peter R. Herman, and Rod Taylor

Journal of Lightwave Technology, Vol. 21, Issue 1, pp. 140- (2003)


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Abstract

Photosensitivity studies of germanosilica planar waveguides were carried out with short-wavelength 157-nm light from an F2 laser. More than a 5 × 10-3 refractive-index change was induced in a nonuniform index profile concentrated near the cladding-core interface and confirmed by an atomic force microscopy in 157-nm radiated fiber. This profile geometry narrows with the laser exposure to offer practical application in trimming phase errors and controlling birefringence in frequency domain modulators where a 1.7 × 10-3 effective index change and a 5 × 10-4 birefringence change were induced, respectively. The 157-nm photosensitivity response is more than 15 times stronger than that by a 248-nm KrF laser and more than twofold stronger than that by a 193-nm ArF laser.

[IEEE ]

Citation
Kevin P. Chen, Peter R. Herman, and Rod Taylor, "Photosensitivity and Application With 157-nm F2 Laser Radiation in Planar Lightwave Circuits," J. Lightwave Technol. 21, 140- (2003)
http://www.opticsinfobase.org/jlt/abstract.cfm?URI=jlt-21-1-140

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