Abstract
We demonstrate integrated optical mirrors in alumina-based waveguides on oxidized silicon substrates. The finite-element method (FEM) is employed for the design of mirrors operating between 1.31 and 1.55 µm at both fundamental polarizations. Excellent agreement between measurement and simulation is achieved for the dispersion behavior of the device. The highly polarization-dependent scattering loss at the reflecting interface is well predicted considering approximate values for the reactive ion etching (RIE) process induced surface roughness.
© 2003 IEEE
PDF Article
More Like This
Cited By
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Login to access Optica Member Subscription