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Journal of Lightwave Technology

Journal of Lightwave Technology

| A JOINT IEEE/OSA PUBLICATION

  • Vol. 23, Iss. 2 — Feb. 1, 2005
  • pp: 474–

Wafer-Based Nanostructure Manufacturing for Integrated Nanooptic Devices

Jian Jim Wang, Lei Chen, Stephen Tai, Xuegong Deng, Paul F. Sciortino, Jiandong Deng, and Feng Liu

Journal of Lightwave Technology, Vol. 23, Issue 2, pp. 474- (2005)


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Abstract

The authors have developed a nanomanufacturing platform based on wafer-level nanoreplication with mold and nanopattern transfer by nanolithography. The nanoreplication process, which is based on imprinting a single-layer spin-coated ultraviolet (UV)-curable resist, achieved good nanopatterning fidelity and on-wafer uniformity with high throughput. Some manufacturing issues of the nanoreplication process, such as the impact of wafer and mold surface particles on nanoreplication yield, are also discussed. Nano-optic devices, such as,quarter-wave plates and polarizers, were manufactured with the nanomanufacturing platform. An average wafer-level optical performance yield of 86% was achieved. The developed technology is applied for high-throughput and low-cost manufacturing nanostructure-based optical devices and integrated optical devices.

© 2005 IEEE

Citation
Jian Jim Wang, Lei Chen, Stephen Tai, Xuegong Deng, Paul F. Sciortino, Jiandong Deng, and Feng Liu, "Wafer-Based Nanostructure Manufacturing for Integrated Nanooptic Devices," J. Lightwave Technol. 23, 474- (2005)
http://www.opticsinfobase.org/jlt/abstract.cfm?URI=jlt-23-2-474

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