The authors have developed a nanomanufacturing platform based on wafer-level nanoreplication with mold and nanopattern transfer by nanolithography. The nanoreplication process, which is based on imprinting a single-layer spin-coated ultraviolet (UV)-curable resist, achieved good nanopatterning fidelity and on-wafer uniformity with high throughput. Some manufacturing issues of the nanoreplication process, such as the impact of wafer and mold surface particles on nanoreplication yield, are also discussed. Nano-optic devices, such as,quarter-wave plates and polarizers, were manufactured with the nanomanufacturing platform. An average wafer-level optical performance yield of 86% was achieved. The developed technology is applied for high-throughput and low-cost manufacturing nanostructure-based optical devices and integrated optical devices.
© 2005 IEEE
Jian Jim Wang, Lei Chen, Stephen Tai, Xuegong Deng, Paul F. Sciortino, Jiandong Deng, and Feng Liu, "Wafer-Based Nanostructure Manufacturing for Integrated Nanooptic Devices," J. Lightwave Technol. 23, 474- (2005)