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Journal of Lightwave Technology

Journal of Lightwave Technology

| A JOINT IEEE/OSA PUBLICATION

  • Vol. 23, Iss. 3 — Mar. 1, 2005
  • pp: 1291–

Fabrication and Characterization of Low-Loss Optical Waveguides Using a Novel Photosensitive Polyimide

N. Yurt, K. Mune, R. Naito, T. Fukuoka, A. Mochizuki, K. Matsumoto, G. Meredith, N. Peyghambarian, and G. E. Jabbour

Journal of Lightwave Technology, Vol. 23, Issue 3, pp. 1291- (2005)


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Abstract

This paper presents simple fabrication of optical waveguides using a novel photosensitive polyimide (PSPI). PSPI has a glass transition temperature (Tg) of 330 °C and is directly patterned by ultraviolet (UV) exposure and wet-chemical development, lending itself to low-cost fabrication techniques. The fabricated waveguides possess low optical absorption at 1.3 and 1.5 µm. Single and multimode buried ridge waveguides were made and tested, and a 0.4-dB/cm optical propagation loss is measured at 1.55 µm.

© 2005 IEEE

Citation
N. Yurt, K. Mune, R. Naito, T. Fukuoka, A. Mochizuki, K. Matsumoto, G. Meredith, N. Peyghambarian, and G. E. Jabbour, "Fabrication and Characterization of Low-Loss Optical Waveguides Using a Novel Photosensitive Polyimide," J. Lightwave Technol. 23, 1291- (2005)
http://www.opticsinfobase.org/jlt/abstract.cfm?URI=jlt-23-3-1291


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