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Journal of Lightwave Technology

Journal of Lightwave Technology

| A JOINT IEEE/OSA PUBLICATION

  • Vol. 23, Iss. 8 — Aug. 1, 2005
  • pp: 2568–

Long-Period Fiber Grating Fabrication by High-Intensity Femtosecond Pulses at 211 nm

Alexey I. Kalachev, David N. Nikogosyan, and Gilberto Brambilla

Journal of Lightwave Technology, Vol. 23, Issue 8, pp. 2568- (2005)


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Abstract

Using high-intensity (110-200 GW/cm2) 250-fs 211-nm laser pulses and a point-by-point technique, the efficiency of long-period grating inscription in H2-loaded standard telecom Corning SMF-28 and H2-free photosensitive B-codoped Fibercore fibers was studied and compared with those at other existing recording methods (low-intensity 157-nm, 193-nm, 248-nm or high-intensity 264-nm fabrications). It was shown that at high-intensity 211-nm laser inscription, two-quantum photoreactions are responsible for long-period fiber grating (LPFG) formation, which results in a significant photosensitivity enhancement in comparison with conventional low-intensity 248-nm exposure (by 45 times for SMF-28 fiber). It was found that the grating strength in the case of SMF-28 fiber, irradiated with high-intensity 211-nm pulses, reaches 28 dB, which is the highest value among all known photochemical approaches. The thermal studies of the recorded gratings were also conducted.

© 2005 IEEE

Citation
Alexey I. Kalachev, David N. Nikogosyan, and Gilberto Brambilla, "Long-Period Fiber Grating Fabrication by High-Intensity Femtosecond Pulses at 211 nm," J. Lightwave Technol. 23, 2568- (2005)
http://www.opticsinfobase.org/jlt/abstract.cfm?URI=jlt-23-8-2568


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