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Journal of Lightwave Technology

Journal of Lightwave Technology

| A JOINT IEEE/OSA PUBLICATION

  • Vol. 25, Iss. 7 — Jul. 1, 2007
  • pp: 1826–1831

Groove-Coupled InGaAs/GaAs Quantum Dot Laser/Waveguide on Silicon

Jun Yang, Zetian Mi, and Pallab Bhattacharya

Journal of Lightwave Technology, Vol. 25, Issue 7, pp. 1826-1831 (2007)


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Abstract

We demonstrate a monolithically integrated laser–waveguide device implemented with InGaAs/GaAs quantum dot heterostructures grown on silicon by molecular beam epitaxy. Focused-ion-beam (FIB) etching is utilized to form high-quality laser mirrors for feedback and grooves for coupling and electrical isolation. Based on a transmission matrix and a generalized beam propagation approach in terms of intensity moments and Gouy phase shifts, a self-consistent model is developed to estimate the reflectivity and coupling coefficient at etched grooves and optimize these parameters for real devices. High-quality FIB-etched facets with a reflectivity of R ~ 0.28 and efficient coupling with coupling coefficients of up to 30% for well-defined grooves have been achieved.

© 2007 IEEE

Citation
Jun Yang, Zetian Mi, and Pallab Bhattacharya, "Groove-Coupled InGaAs/GaAs Quantum Dot Laser/Waveguide on Silicon," J. Lightwave Technol. 25, 1826-1831 (2007)
http://www.opticsinfobase.org/jlt/abstract.cfm?URI=jlt-25-7-1826


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