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Journal of Lightwave Technology

Journal of Lightwave Technology

| A JOINT IEEE/OSA PUBLICATION

  • Vol. 27, Iss. 10 — May. 15, 2009
  • pp: 1387–1391

High $Q$-Factor Microrings Using Slightly Etched Rib Waveguides

Sylvain Maine, Delphine Marris-Morini, Laurent Vivien, Eric Cassan, Daniel Pascal, Suzanne Laval, Régis Orobtchouk, Bing Han, Taha Benyattou, Loubna El Melhaoui, and Jean-Marc Fédéli

Journal of Lightwave Technology, Vol. 27, Issue 10, pp. 1387-1391 (2009)


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Abstract

The paper reports the design, fabrication and characterization of silicon-on-insulator (SOI) microring resonators using shallow etched rib waveguides. The variation of the $Q$-factor of microring resonators as a function of the ring diameter and coupling gap between the input waveguide and the ring is studied. Such structures are fabricated using e-beam lithography and reactive ion etching steps. Propagation loss of shallow etching rib waveguide has been evaluated to 0.8 dB/cm for wavelengths around 1550 nm. With a ring diameter of 100 $\mu{\rm m}$ and a coupling gap of 450 nm, the measured $Q$-factor is 35300. These results are matched by 3-D numerical optical modeling.

© 2009 IEEE

Citation
Sylvain Maine, Delphine Marris-Morini, Laurent Vivien, Eric Cassan, Daniel Pascal, Suzanne Laval, Régis Orobtchouk, Bing Han, Taha Benyattou, Loubna El Melhaoui, and Jean-Marc Fédéli, "High $Q$-Factor Microrings Using Slightly Etched Rib Waveguides," J. Lightwave Technol. 27, 1387-1391 (2009)
http://www.opticsinfobase.org/jlt/abstract.cfm?URI=jlt-27-10-1387


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