Abstract

UV-based nano imprint and transfer lithography (NITL) is proposed as a flexible, low cost and versatile approach for defining sub-micron metal patterns on optical fiber facets in a single-processing step. NITL relies on a specially prepared mold carrying the pattern that is to be transferred to the facet. The fiber's light-guiding properties allow control of the position of the metal structures by optical alignment.

© 2009 IEEE

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