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Journal of Lightwave Technology

Journal of Lightwave Technology

| A JOINT IEEE/OSA PUBLICATION

  • Vol. 27, Iss. 10 — May. 15, 2009
  • pp: 1415–1420

Metal Grating Patterning on Fiber Facets by UV-Based Nano Imprint and Transfer Lithography Using Optical Alignment

Stijn Scheerlinck, Peter Dubruel, Peter Bienstman, Etienne Schacht, Dries Van Thourhout, and Roel Baets

Journal of Lightwave Technology, Vol. 27, Issue 10, pp. 1415-1420 (2009)


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Abstract

UV-based nano imprint and transfer lithography (NITL) is proposed as a flexible, low cost and versatile approach for defining sub-micron metal patterns on optical fiber facets in a single-processing step. NITL relies on a specially prepared mold carrying the pattern that is to be transferred to the facet. The fiber's light-guiding properties allow control of the position of the metal structures by optical alignment.

© 2009 IEEE

Citation
Stijn Scheerlinck, Peter Dubruel, Peter Bienstman, Etienne Schacht, Dries Van Thourhout, and Roel Baets, "Metal Grating Patterning on Fiber Facets by UV-Based Nano Imprint and Transfer Lithography Using Optical Alignment," J. Lightwave Technol. 27, 1415-1420 (2009)
http://www.opticsinfobase.org/jlt/abstract.cfm?URI=jlt-27-10-1415

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