Metal Grating Patterning on Fiber Facets by UV-Based Nano Imprint and Transfer Lithography Using Optical Alignment
Journal of Lightwave Technology, Vol. 27, Issue 10, pp. 1415-1420 (2009)
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Abstract
UV-based nano imprint and transfer lithography (NITL) is proposed as a flexible, low cost and versatile approach for defining sub-micron metal patterns on optical fiber facets in a single-processing step. NITL relies on a specially prepared mold carrying the pattern that is to be transferred to the facet. The fiber's light-guiding properties allow control of the position of the metal structures by optical alignment.
© 2009 IEEE
Citation
Stijn Scheerlinck, Peter Dubruel, Peter Bienstman, Etienne Schacht, Dries Van Thourhout, and Roel Baets, "Metal Grating Patterning on Fiber Facets by UV-Based Nano Imprint and Transfer
Lithography Using Optical Alignment," J. Lightwave Technol. 27, 1415-1420 (2009)
http://www.opticsinfobase.org/jlt/abstract.cfm?URI=jlt-27-10-1415
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