UV-based nano imprint and transfer lithography (NITL) is proposed as a flexible, low cost and versatile approach for defining sub-micron metal patterns on optical fiber facets in a single-processing step. NITL relies on a specially prepared mold carrying the pattern that is to be transferred to the facet. The fiber's light-guiding properties allow control of the position of the metal structures by optical alignment.
© 2009 IEEE
Stijn Scheerlinck, Peter Dubruel, Peter Bienstman, Etienne Schacht, Dries Van Thourhout, and Roel Baets, "Metal Grating Patterning on Fiber Facets by UV-Based Nano Imprint and Transfer Lithography Using Optical Alignment," J. Lightwave Technol. 27, 1415-1420 (2009)