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Journal of Lightwave Technology

Journal of Lightwave Technology

| A JOINT IEEE/OSA PUBLICATION

  • Vol. 27, Iss. 19 — Oct. 1, 2009
  • pp: 4306–4310

Optical Quality Improvement of Si Photonic Devices Fabricated by Focused-Ion-Beam Milling

Jie Tian, Wei Yan, Yazhao Liu, Jun Luo, Daozhong Zhang, Zhiyuan Li, and Min Qiu

Journal of Lightwave Technology, Vol. 27, Issue 19, pp. 4306-4310 (2009)


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Abstract

Focused-ion-beam directly milling strategy was used to fabricate photonic resonators on crystalline silicon-on-insulator substrate. In order to reduce damages such as implanting ions, amorphous layers and re-deposition process which are induced by the ions, a sacrificed silica layer was used as an etching mask and a silicon thermal oxidation process was performed. The transmission spectra of both photonic crystal cavities and micro-ring resonators were measured. The resulting data demonstrate that the Q factors are significantly improved after the oxidation treatment.

© 2009 IEEE

Citation
Jie Tian, Wei Yan, Yazhao Liu, Jun Luo, Daozhong Zhang, Zhiyuan Li, and Min Qiu, "Optical Quality Improvement of Si Photonic Devices Fabricated by Focused-Ion-Beam Milling," J. Lightwave Technol. 27, 4306-4310 (2009)
http://www.opticsinfobase.org/jlt/abstract.cfm?URI=jlt-27-19-4306


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