OSA's Digital Library

Journal of Lightwave Technology

Journal of Lightwave Technology


  • Vol. 27, Iss. 19 — Oct. 1, 2009
  • pp: 4306–4310

Optical Quality Improvement of Si Photonic Devices Fabricated by Focused-Ion-Beam Milling

Jie Tian, Wei Yan, Yazhao Liu, Jun Luo, Daozhong Zhang, Zhiyuan Li, and Min Qiu

Journal of Lightwave Technology, Vol. 27, Issue 19, pp. 4306-4310 (2009)

View Full Text Article

Acrobat PDF (753 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

  • Export Citation/Save Click for help


Focused-ion-beam directly milling strategy was used to fabricate photonic resonators on crystalline silicon-on-insulator substrate. In order to reduce damages such as implanting ions, amorphous layers and re-deposition process which are induced by the ions, a sacrificed silica layer was used as an etching mask and a silicon thermal oxidation process was performed. The transmission spectra of both photonic crystal cavities and micro-ring resonators were measured. The resulting data demonstrate that the Q factors are significantly improved after the oxidation treatment.

© 2009 IEEE

Jie Tian, Wei Yan, Yazhao Liu, Jun Luo, Daozhong Zhang, Zhiyuan Li, and Min Qiu, "Optical Quality Improvement of Si Photonic Devices Fabricated by Focused-Ion-Beam Milling," J. Lightwave Technol. 27, 4306-4310 (2009)

Sort:  Year  |  Journal  |  Reset


  1. B. S. Song, S. Noda, T. Asano, Y. Akahane, "Ultra-high-Q photonic double-heterostructure nanocavity," Nat. Mater. 4, 207-210 (2005).
  2. M. Notomi, A. Shinya, S. Mitsugi, E. Kuramochi, H.-Y. Ryu, "Waveguides, resonators and their coupled elements in photonic crystals slabs," Opt. Exp. 12, 1551-1561 (2004).
  3. V. R. Almeida, C. A. Barrios, R. R. Panepucci, M. Lipson, "All-optical control of light on a silicon chip," Nature 431, 1081-1084 (2004).
  4. T. Tanabe, M. Notomi, S. Mitsugi, A. Shinya, E. Kuramochi, "All-optical switching on a silicon chip realized using photonic crystal nanocavity," App. Phys. Lett. 87, 151112- (2005).
  5. P. Dong, S. F. Preble, M. Lipson, "All-optical compact silicon comb switch," Opt. Exp. 15, 9600-9605 (2007).
  6. S. F. Preble, Q. Xu, B. S. Schmidt, M. Lipson, "Ultrafast all-optical modulation on a silicon chip," Opt. Lett. 30, 2891-2893 (2005).
  7. M. Soljacic, M. Ibanescu, S. G. Johnson, Y. Fink, D. Joannopoulos, "Optical bistable switching in nonlinear photonic crystals," Phys. Rev. E. 66, 055601(R) (2002).
  8. Q. Xu, B. Schmidt, S. Pradhan, M. Lipson, "Micrometre-scale silicon electro-optic modulator," Nature 435, 325-327 (2005).
  9. Q. Li, Z. Zhang, F. Liu, M. Qiu, Y. Su, "Dense wavelength conversion and multicasting in a resonance-split silicon microring," Appl. Phys. Lett. 93, 081113 (2008).
  10. Y. Tanaka, J. Upham, T. Nagashima, T. Sugiya, T. Asano, S. Noda, "Dynamic control of the Q factor in a photonic crystal nanocavity," Nat. Mater. 6, 862-865 (2007).
  11. F. Liu, Q. Li, Z. Zhang, M. Qiu, Y. Su, "Optically tunable delay line in silicon microring resonator based on thermal nonlinear effect," IEEE J. Sel. Quantum Electron. 14, 706-712 (2008).
  12. Z. Zhang, M. Dainese, L. Wosinski, M. Qiu, "Resonance-splitting and enhanced notch depth in SOI ring resonators with mutual mode coupling," Opt. Exp. 16, 4621- (2008).
  13. J. Tian, C. Ren, S. Feng, Y. Z. Liu, H. H. Tiao, Z. Y. Li, B. Y. Cheng, D. Z. Zhang, A. Z. Jin, "Optical properties of the direct-coupled Y-branch filters by using photonic crystal slabs," Chin. Phys. 15, 2471-2475 (2006).
  14. C. Ren, J. Tian, S. Feng, H. H. Tao, Y. Z. Liu, K. Ren, Z. Y. Li, B. Y. Cheng, D. Z. Zhang, H. F. Yang, "High resolution three-port filter in two dimensional photonic crystal slabs," Opt. Exp. 14, 10014-10020 (2006).
  15. Z. Y. Zhang, M. Qiu, "Coupled-mode analysis of a resonant channel drop filter using waveguides with mirror boundaries," J. Opt. Amer. B 23, 104-113 (2006).
  16. C. Manolatou, M. J. Khan, S. Fan, P. R. Villeneuve, H. A. Haus, J. D. Joannopoulos, "Coupling of modes analysis of resonant channel add-drop filters," IEEE J. Quantum Electron. 35, 1322-1331 (1999).
  17. J. Niehusman, A. Vörckel, P. H. Bolivar, T. Wahlbrink, W. Henschel, H. Kurz, "Ultrahigh-quality-factor silicon-on-insulator microring resonator," Opt. Lett. 29, 2861-2863 (2004).
  18. W. Bogaerts, V. Wiaux, D. Taillaert, S. Beckx, B. Luyssaert, P. Bienstman, R. Baets, "Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography," IEEE J. Sel. Topics. Quant. Electron. 8, 928-934 (2002).
  19. J. Melngailis, "Focused ion beam technology and applications," J. Vac. Sci. Techol. B5 2, 469-495 (1987).
  20. T. Tao, W. Wilkinson, J. Melngailis, "Focused ion beam induced deposition of platinum for repair process," J. Vac. Sci. Technol. B 9, 162-164 (1991).
  21. X. Y. Hu, Y. H. Liu, J. Tian, B. Y. Cheng, D. Z. Zhang, "Ultrafast all optical switching in two-dimensional organic photonic crystal," Appl. Phys. Lett. 86, 121102 (2005).
  22. M. Sun, J. Tian, Z. Y. Li, B. Y. Cheng, D. Z. Zhang, A. Z. Jin, H. F. Yang, "The role of periodicity in enhanced transmission through subwavelength holes array," Chin. Phys. Lett. 23, 486-488 (2006).
  23. J. M. Caltrney, R. D. Smith, P. R. Munroe, "Transmission electron microscope specimen preparation of metal matrix compodotes using the focused ion beam miller," Mictosc. Microanal. 6, 452-462 (2000).
  24. R. M. Langford, A. K. Petford-Long, "Reduction the sidewall damage and gallium concentration of focused ion beam prepared TEM cross sections," Proc. EUREM (2000) pp. 557-558.
  25. N. I. Kato, Y. Kohno, H. Saka, "Side-wall damage in a transmission electron microscopy specimen of crystalline Si prepeared by focused ion beam etching," J. Vac. Sci. Technol. A 17, 1201-1204 (1999).
  26. C. R. Hutchinson, R. E. Hackenberg, G. J. Shiflter, "A compareison of EDS microanalysis in FIB-prepared and electropolished thin foils," Ultramicroscopy 94, 37-48 (2003).
  27. S. Rubanov, P. R. Munroe, "FIB-induced damages in silicon," J. Microscopy 214, 213-221 (2003).
  28. Y. Tanaka, M. Tymczenko, T. Asano, S. Noda, "Fabrication of two-dimensional photonic crystal slab point-defect cavity employing local three-dimensional structures," Jpn. J. Appl. Phys. 45, 6096-6102 (2006).
  29. X. L. Fu, P. G. Li, A. Z. Jin, L. M. Chen, H. F. Yang, L. H. Li, W. H. Tang, Z. Cui, "Gas-assisted etching of niobium with focused ion beam," Microelectron. Eng. 78–79, 29-33 (2005).
  30. J. Schrauwen, F. V. Laere, D. V. Thourhout, R. Baets, "Focused-ion-beam fabrication of slanted grating coupler in silicon-on-insulator waveguides," IEEE Photon. Technol. Lett. 19, 816-818 (2007).
  31. T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamachika, S. Itabashi, H. Morita, "Microphotonics devices based on silicon microfabrication technology," IEEE J. Sel. Top. Quantum Electron. 11, 232-240 (2005).

Cited By

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited