We report on the fabrication and characterization of optical channel waveguide in <i>x</i>-cut KTiOAsO<sub>4</sub> crystal produced by photographic masking and following direct O<sup>+</sup>ion implantation at energy of 3.0 MeV and fluence of 5 × 10<sup>13</sup> ions/cm<sup>2</sup>. Positive changes of both <i>n<sub>x</sub></i> and <i>n<sub>y</sub></i> refractive indices (corresponding TM and TE polarized light respectively) in the waveguide region are responsible for light waveguiding. After annealing treatment, the propagation losses of the waveguide could be reduced to 1.2 dB/cm, exhibiting acceptable guiding properties.
© 2011 IEEE
Yang Jiao and Lei Wang, "Optical Channel Waveguide in KTiOAsO4 Crystals Produced by O+ion Implantation," J. Lightwave Technol. 30, 1433-1436 (2012)