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Journal of Lightwave Technology

Journal of Lightwave Technology

| A JOINT IEEE/OSA PUBLICATION

  • Vol. 30, Iss. 15 — Aug. 1, 2012
  • pp: 2488–2493

ALD-Assisted Multiorder Dispersion Engineering of Nanophotonic Strip Waveguides

Mikhail Erdmanis, Lasse Karvonen, Muhammad Rizwan Saleem, Mikko Ruoho, Ville Pale, Ari Tervonen, Seppo Honkanen, and Ilkka Tittonen

Journal of Lightwave Technology, Vol. 30, Issue 15, pp. 2488-2493 (2012)


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Abstract

We propose a new technique for the multiorder dispersion engineering of nanophotonic strip waveguides. Unlike other techniques, the method does not require wafers with customized parameters and is fully compatible with standard wafers used in nanophotonics. The dispersion management is based on the application of nanometer-thick TiO2 layer formed by atomic layer deposition. The method is simple and reliable and allows good control of dispersion up to the fourth-order terms. The additional advantages are the reduction of propagation losses and partial compensation of fabrication tolerances.

© 2012 IEEE

Citation
Mikhail Erdmanis, Lasse Karvonen, Muhammad Rizwan Saleem, Mikko Ruoho, Ville Pale, Ari Tervonen, Seppo Honkanen, and Ilkka Tittonen, "ALD-Assisted Multiorder Dispersion Engineering of Nanophotonic Strip Waveguides," J. Lightwave Technol. 30, 2488-2493 (2012)
http://www.opticsinfobase.org/jlt/abstract.cfm?URI=jlt-30-15-2488

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