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Journal of Lightwave Technology

Journal of Lightwave Technology

| A JOINT IEEE/OSA PUBLICATION

  • Vol. 30, Iss. 18 — Sep. 15, 2012
  • pp: 3017–3025

Polarization Matching in AlGaN-Based Multiple-Quantum-Well Deep Ultraviolet Laser Diodes on AlN Substrates Using Quaternary AlInGaN Barriers

Md. Mahbub Satter, Zachary Lochner, Jae-Hyun Ryou, Shyh-Chiang Shen, Russell D. Dupuis, and Paul Douglas Yoder

Journal of Lightwave Technology, Vol. 30, Issue 18, pp. 3017-3025 (2012)


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Abstract

A prototypical design of AlGaN deep ultraviolet (DUV) laser diodes (LDs) on AlN substrates employing tapered electron blocking layer is presented. Two-dimensional optoelectronic simulation predicts lasing at a target wavelength of 250 nm. Degradation of optical gain associated with spatial separation of electron and hole wave functions inside the active region may be considerably reduced in designs featuring quaternary AlInGaN barriers, by virtue of polarization charge matching. A systematic method for selection of polarization-free quaternary barrier compositions is proposed for 250 nm DUV LD designs, accompanied by a sensitivity analysis. The selection procedure presented here is readily applied to LDs and light-emitting diodes operating at other wavelengths.

© 2012 IEEE

Citation
Md. Mahbub Satter, Zachary Lochner, Jae-Hyun Ryou, Shyh-Chiang Shen, Russell D. Dupuis, and Paul Douglas Yoder, "Polarization Matching in AlGaN-Based Multiple-Quantum-Well Deep Ultraviolet Laser Diodes on AlN Substrates Using Quaternary AlInGaN Barriers," J. Lightwave Technol. 30, 3017-3025 (2012)
http://www.opticsinfobase.org/jlt/abstract.cfm?URI=jlt-30-18-3017

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