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Journal of Lightwave Technology

Journal of Lightwave Technology

| A JOINT IEEE/OSA PUBLICATION

  • Vol. 30, Iss. 19 — Oct. 1, 2012
  • pp: 3089–3095

Simulation of SSB-LC With D-EML for Extended PON Beyond the Chromatic Dispersion Limit

Thomas Anfray, Christelle Aupetit-Berthelemot, Khalil Kechaou, Didier Erasme, Guy Aubin, Christophe Kazmierski, and Philippe Chanclou

Journal of Lightwave Technology, Vol. 30, Issue 19, pp. 3089-3095 (2012)


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Abstract

The dual electro-absorption modulated laser (D-EML) is a transmitter technology based on distributed feedback laser and electro-absorption modulator integrated on the same chip with dual independent-access modulation. The D-EML allows the adjustment of its optical signal spectral content by controlling independently the laser and modulator amplitude modulations in order to enhance the transmission distance beyond usual chromatic dispersion limit without increasing consumption, cost, and complexity. We develop a D-EML model based on experimental characterization in order to demonstrate by simulation the interest of dual-modulation format for optical systems at 10, 25, and 40 Gb/s.

© 2012 IEEE

Citation
Thomas Anfray, Christelle Aupetit-Berthelemot, Khalil Kechaou, Didier Erasme, Guy Aubin, Christophe Kazmierski, and Philippe Chanclou, "Simulation of SSB-LC With D-EML for Extended PON Beyond the Chromatic Dispersion Limit," J. Lightwave Technol. 30, 3089-3095 (2012)
http://www.opticsinfobase.org/jlt/abstract.cfm?URI=jlt-30-19-3089


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