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Journal of Lightwave Technology

Journal of Lightwave Technology

| A JOINT IEEE/OSA PUBLICATION

  • Vol. 31, Iss. 10 — May. 15, 2013
  • pp: 1670–1670

Corrections to “Amplitude and Phase Drift Correction of EFPI Sensor Systems Using Both Adaptive Kalman Filter and Temperature Compensation for Nanometric Displacement Estimation”

P. Chawah, A. Sourice, G. Plantier, H. C. Seat, F. Boudin, J. Chéry, M. Cattoen, P. Bernard, C. Brunet, S. Gaffet, and D. Boyer

Journal of Lightwave Technology, Vol. 31, Issue 10, pp. 1670-1670 (2013)


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Abstract

In the above paper [1], the affiliation of H.S. Seat and M. Catteon should be modified to read as: H. C. Seat and M. Catteon are with the Optoelectronics for Embedded Systems Group, Laboratory for Analysis and Architecture of Systems (LAAS), CNRS, 31400 Toulouse, France, and also with the Université de Toulouse, INP, LAAS, F-31400 Toulouse, France.

© 2013 IEEE

Citation
P. Chawah, A. Sourice, G. Plantier, H. C. Seat, F. Boudin, J. Chéry, M. Cattoen, P. Bernard, C. Brunet, S. Gaffet, and D. Boyer, "Corrections to “Amplitude and Phase Drift Correction of EFPI Sensor Systems Using Both Adaptive Kalman Filter and Temperature Compensation for Nanometric Displacement Estimation”," J. Lightwave Technol. 31, 1670-1670 (2013)
http://www.opticsinfobase.org/jlt/abstract.cfm?URI=jlt-31-10-1670


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References

  1. P. Chawah, A. Sourice, G. Plantier, H. C. Seat, F. Boudin, J. Chéry, M. Cattoen, P. Bernard, C. Brunet, S. Gaffet, D. Boyer, "Amplitude and phase drift correction of EFPI sensor systems using both adaptive kalman filter and temperature compensation for nanometric displacement estimation," J. Lightw. Technol. 30, 2195-2202 (2012).

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