OSA's Digital Library

Journal of Lightwave Technology

Journal of Lightwave Technology

| A JOINT IEEE/OSA PUBLICATION

  • Vol. 20, Iss. 4 — Apr. 1, 2002
  • pp: 562–765
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Articles Sorted by Page Range

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 562– (2002)
  • Ioannis Tomkos, Robert Hesse, Nicholas Madamopoulos, Clint Friedman, Neophytos Antoniades, Brad Hallock, Richard Vodhanel, and Aleksandra Boskovic

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 574– (2002)
  • Michael Duser and Polina Bayvel

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 586– (2002)
  • E. Ibragimov, G. Shtengel, and S. Suh

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 591– (2002)
  • Masaki Amemiya

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 598– (2002)
  • Anes Hodzie, Beate Konrad, and Klaus Petermann

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 608– (2002)
  • R.-M. Mu and C. R. Menyuk

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 618– (2002)
  • Colja Schubert, Jorn Berger, Stefan Diez, Hans Jurgen Ehrke, Reinhold Ludwig, Uwe Feiste, Carsten Schmidt, Hans G. Weber, Gueorgui Toptchiyski, Sebastian Randel, and Klaus Petermann

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 625– (2002)
  • Hiroki Takesue and Tsuneo Horiguchi

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 634– (2002)
  • Elena Avram, Waqar Mahmood, and Murat Ozer

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 638– (2002)
  • Hajime Sakata and Aya Imada

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 643– (2002)
  • M. P. Earnshaw and D. W. E. Allsopp

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 651– (2002)
  • J. C. G. de Sande, G. Leo, and G. Assanto

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 661– (2002)
  • Pascual Munoz, Daniel Pastor, and Jose Capmany

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 675– (2002)
  • Shuichi Nagai, Goh Morishima, Hirokazu Inayoshi, and Katsuyuki Utaka

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 682– (2002)
  • Hanxing Shi

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 689– (2002)
  • S.-C. Cao and J. C. Cartledge

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 696– (2002)
  • A. Banoushi, V. Ahmadi, and S. Setayeshi

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 700– (2002)
  • Yonglin Yu and Ronan O'Dowd

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 705– (2002)
  • Ken Suto, Takao Saito, Tomoyuki Kimura, Jun-Ichi Nishizawa, and Tadao Tanabe

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 712– (2002)
  • Olga A. Lavrova, Lavanya Rau, and Daniel J. Blumenthal

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 718– (2002)
  • K. Dreyer, C. H. Joyner, J. L. Pleumeekers, C. A. Burrus, A. Dentai, B. I. Miller, S. Shunk, P. Sciortino, S. Chandrasekhar, L. Buhl, F. Storz, and M. Farwell

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 722– (2002)
  • Tatsuya Takeshita, Toshiaki Kagawa, Kouta Tateno, mu Tadanaga, Yuichi Tohmori, and Chikara Amano

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 730– (2002)
  • Pal Maak, Istvan Frigyes, Laszlo Jakab, Istvan Habermayer, Mihaly Gyukics, and Peter Richter

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 740– (2002)
  • Dai Imaizumi, Tomokatsu Hayakawa, and Masayuki Nogami

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 745– (2002)
  • Shuichi Suzuki, Yutaka Hatakeyama, Yasuo Kokubun, and Sai Tak Chu

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 751– (2002)
  • N. Somasiri, B. M. A. Rahman, and S. S. A. Obayya

  • Journal of Lightwave Technology, Vol. 20, Iss. 4, pp. 758– (2002)
  • J. N. McMullin, R. G. DeCorby, and C. J. Haugen
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