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Journal of the Optical Society of America

Journal of the Optical Society of America

  • Vol. 35, Iss. 2 — Feb. 1, 1945
  • pp: 93–107

Quantum Theory of Exposure Tested Extensively on Photographic Emulsions

LUDWIK SILBERSTEIN and A. P. H. TRIVELLI  »View Author Affiliations


JOSA, Vol. 35, Issue 2, pp. 93-107 (1945)
http://dx.doi.org/10.1364/JOSA.35.000093


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Citation
LUDWIK SILBERSTEIN and A. P. H. TRIVELLI, "Quantum Theory of Exposure Tested Extensively on Photographic Emulsions," J. Opt. Soc. Am. 35, 93-107 (1945)
http://www.opticsinfobase.org/josa/abstract.cfm?URI=josa-35-2-93


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References

  1. L. Silberstein, J. Opt. Soc. Am. 32, 474–485 (1942).
  2. L. Silberstein and A. P. H. Trivelli, J. Opt. Soc. Am. 28, 441 (1938).
  3. For the four shorter, and αG(y) + βF(y/m) for the two longest developments.
  4. For all but the shortest (1 min.) development which calls for αF(y)+βG(y/m), α:β=9:8.

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