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Journal of the Optical Society of America

Journal of the Optical Society of America

  • Vol. 67, Iss. 12 — Dec. 1, 1977
  • pp: 1644–1650

Index and surface simultaneous modulation in negative photoresist films

J. Frejlich and J. J. Clair  »View Author Affiliations


JOSA, Vol. 67, Issue 12, pp. 1644-1650 (1977)
http://dx.doi.org/10.1364/JOSA.67.001644


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Abstract

A considerable index-of-refraction modulation effect was found to occur in a negative photoresist when molecular-mass-diffusion is facilitated. This resist may then be used either as an autodeveloping indexmodulation recording material, or as a surface-modulation recording material or both, depending on the procedure utilized for recording and developing. Surface and index modulation are studied in a thin resist film by recording a 100 I/mm grating on it and measuring its diffraction spectrum. An approximative though simple method for analyzing this spectrum used in finding out the corresponding grating transmission phase modulation is briefly exposed.

© 1978 Optical Society of America

Citation
J. Frejlich and J. J. Clair, "Index and surface simultaneous modulation in negative photoresist films," J. Opt. Soc. Am. 67, 1644-1650 (1977)
http://www.opticsinfobase.org/josa/abstract.cfm?URI=josa-67-12-1644

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