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Journal of the Optical Society of America

Journal of the Optical Society of America

  • Vol. 39, Iss. 12 — Dec. 1, 1949
  • pp: 1044–1045

A Method for Measuring Extremely Small Non-Uniformities in the Optical Thickness of Evaporated Films

ALAN E. GEE and HARRY D. POLSTER  »View Author Affiliations


JOSA, Vol. 39, Issue 12, pp. 1044-1045 (1949)
http://dx.doi.org/10.1364/JOSA.39.001044


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Abstract

Methods are described for measuring accurately the half-widths of frustrated total reflection niters (see reference 1) of very narrow pass bands, and for detecting extremely small non-uniformities in the spacer layers of these filters. The latter method, permitting observation and measurement of thin film non-uniformities appreciably less than one unit cell provides a very sensitive means of studying thin film structures and the mechanism of formation.

Citation
ALAN E. GEE and HARRY D. POLSTER, "A Method for Measuring Extremely Small Non-Uniformities in the Optical Thickness of Evaporated Films," J. Opt. Soc. Am. 39, 1044-1045 (1949)
http://www.opticsinfobase.org/josa/abstract.cfm?URI=josa-39-12-1044


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References

  1. P. Leurgans, and A. F. Turner, "Frustrated total reflection interference filters," J. Opt. Soc. Am. 37, 983A (1947).
  2. Harry D. Polster, J. Opt. Soc. Am. 39, 1038 (1949).

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