A Method for Measuring Extremely Small Non-Uniformities in the Optical Thickness of Evaporated Films
JOSA, Vol. 39, Issue 12, pp. 1044-1045 (1949)
http://dx.doi.org/10.1364/JOSA.39.001044
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Abstract
Methods are described for measuring accurately the half-widths of frustrated total reflection niters (see reference 1) of very narrow pass bands, and for detecting extremely small non-uniformities in the spacer layers of these filters. The latter method, permitting observation and measurement of thin film non-uniformities appreciably less than one unit cell provides a very sensitive means of studying thin film structures and the mechanism of formation.
Citation
ALAN E. GEE and HARRY D. POLSTER, "A Method for Measuring Extremely Small Non-Uniformities in the Optical Thickness of Evaporated Films," J. Opt. Soc. Am. 39, 1044-1045 (1949)
http://www.opticsinfobase.org/josa/abstract.cfm?URI=josa-39-12-1044
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