OSA's Digital Library

Journal of the Optical Society of America

Journal of the Optical Society of America

  • Vol. 64, Iss. 6 — Jun. 1, 1974
  • pp: 804–811

Design and operation of an automated, high-temperature ellipsometer

Y. J. van der Meulen and N. C. Hien  »View Author Affiliations

JOSA, Vol. 64, Issue 6, pp. 804-811 (1974)

View Full Text Article

Acrobat PDF (943 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools



A computer-assisted, ellipsometric system performs in situ measurements on substrates and thin films in various atmospheres, at temperatures up to 1450 K. A laser is used as the light source. The light flux exiting from a rotating analyzer is measured at 512 equally spaced intervals, to yield a flux ellipse that is used for further analysis. Data acquisition and data reduction are under control of an IBM System/7 computer. Ab initio calibration of the optical components using a fixed angle of incidence is possible; the cell windows are considered as small-retardation wave plates. Effects of non-ideality of polarizer and analyzer were negligible. Refractive indices of silicon (nSI*) and thermally grown silicon dioxide (nSiO2) are reported as functions of temperature up to 1350 K.

Y. J. van der Meulen and N. C. Hien, "Design and operation of an automated, high-temperature ellipsometer," J. Opt. Soc. Am. 64, 804-811 (1974)

Sort:  Author  |  Journal  |  Reset


  1. Proceedings of the Symposium on Ellipsometry in the Measurement of Surfaces and Thin Films, Washington, D. C., 1963, edited by E. Passaglia, R. R. Stromberg, and J. Kruger, Natl. Bur. Stand. (U. S.) Misc. Publ. No. 256 (U. S. Government Printing Office, Washington, D. C., 1964).
  2. Proceedings of the Symposium on Recent Developmnents in Ellipsometry, Lincoln, Nebr., 1968, edited by N. M. Bashara, A. B. Buckman, and A. C. Hall, in Surf. Sci. 16, 137–192 (1969).
  3. R. J. Archer, J. Opt. Soc. Am. 52, 970 (1962).
  4. J. M. Eldridge and D. W. Dong, Surf. Science 40, 512 (1973).
  5. P. S. Hauge and F. H. Dill, IBM J. Res. Dev. 17, 472 (1973).
  6. J. W. Hartwell, IBM J. Res. Dev. 15, 355 (1971).
  7. N. C. Hien and R. V. Dobransky, IBM Internal Report No. RC 4307 (April 1973).
  8. Laboratory Automation Basic Supervisor for the IBM S/7. IBM Internal Report No. RJ 1185 (April 1973).
  9. B. D. Cahan and R. F. Spanier, Surf. Sci. 16, 166 (1969).
  10. R. Greef, Rev. Sci. Instr. 41, 532 (1970).
  11. W. R. Hunter, J. Opt. Soc. Am. 63, 951 (1973).
  12. F. L. McCrackin, E. Passaglia, R. R. Stromberg, and H. L. Steinberg, J. Res. Natl. Bur. Stand. (U. S.) A67, 363 (1963).
  13. R. M. A. Azzam and N. M. Bashara, J. Opt. Soc. Am. 61, 600 (1971).
  14. R. M. A. Azzam and N. M. Bashara, J. Opt. Soc. Am. 61, 773 (1971).
  15. F. L. McCrackin, J. Opt. Soc. Am. 60, 57 (1970).
  16. W. C. Dash and R. Newman, Phys. Rev. 99, 1151 (1955).
  17. A. S. Grove, Physics and Technology of Semiconductor Devices (Wiley, New York, 1967), p. 102.
  18. Y. J. van der Meulen, C. M. Osburn, and J. F. Ziegler, The Electrochemical Society, Spring Meeting 1973, Extended Abstract No. 45.

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited