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Journal of the Optical Society of America

Journal of the Optical Society of America

  • Vol. 64, Iss. 6 — Jun. 1, 1974
  • pp: 804–811

Design and operation of an automated, high-temperature ellipsometer

Y. J. van der Meulen and N. C. Hien  »View Author Affiliations


JOSA, Vol. 64, Issue 6, pp. 804-811 (1974)
http://dx.doi.org/10.1364/JOSA.64.000804


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Abstract

A computer-assisted, ellipsometric system performs in situ measurements on substrates and thin films in various atmospheres, at temperatures up to 1450 K. A laser is used as the light source. The light flux exiting from a rotating analyzer is measured at 512 equally spaced intervals, to yield a flux ellipse that is used for further analysis. Data acquisition and data reduction are under control of an IBM System/7 computer. Ab initio calibration of the optical components using a fixed angle of incidence is possible; the cell windows are considered as small-retardation wave plates. Effects of non-ideality of polarizer and analyzer were negligible. Refractive indices of silicon (<i>n</i><sub>SI</sub><sup>*</sup>) and thermally grown silicon dioxide (<i>n</i><sub>SiO</sub><sub>2</sub>) are reported as functions of temperature up to 1350 K.

Citation
Y. J. van der Meulen and N. C. Hien, "Design and operation of an automated, high-temperature ellipsometer," J. Opt. Soc. Am. 64, 804-811 (1974)
http://www.opticsinfobase.org/josa/abstract.cfm?URI=josa-64-6-804


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References

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