Phase-hologram material by using four-center-type photopolymerization in the crystalline state
JOSA, Vol. 67, Issue 12, pp. 1651-1655 (1977)
http://dx.doi.org/10.1364/JOSA.67.001651
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Abstract
A new dry-process recording material using photopolymerization in the crystalline state is proposed as an ideal material for holographic interferometry, especially for real-time holographic interferometry. The performance of the complex recording material comprising m-PDA as a photopolymerizing reactant and picramide as a spectral sensitizer were evaluated. The development of this complex recording material is accomplished simply by heating it; fixation occurs at room temperature. We were able to make a holographic grating with resolution up to 1930 lines per millimeter using this material with a He-Cd laser oscillating at 442 nm. The maximum diffraction efficiency and the sensitivity corresponding to a 30% diffraction efficiency as a volume phase hologram were estimated as 36.3% and 5.6 mJ/cm2, respectively.
© 1978 Optical Society of America
Citation
Takashi Mizuno, Shuzo Hattori, and Masahiro Tawata, "Phase-hologram material by using four-center-type photopolymerization in the crystalline state," J. Opt. Soc. Am. 67, 1651-1655 (1977)
http://www.opticsinfobase.org/josa/abstract.cfm?URI=josa-67-12-1651
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