Dielectric function measurements on ion-implanted metallic systems
JOSA, Vol. 67, Issue 8, pp. 1099-1101 (1977)
http://dx.doi.org/10.1364/JOSA.67.001099
Acrobat PDF (366 KB)
Abstract
We report a study of the feasibility of dielectric function measurements on ion-implanted metallic systems as a possible means to characterize such systems. Ellipsometric measurements were performed from 1.8 to 5.5 eV on Au films implanted with Cl, Ar, K, and Li impurities. The results demonstrate that measurable changes in ε(ω) do occur and indicate that effects arising from both radiation damage and the chemical nature of the impurity are present.
© 1977 Optical Society of America
Citation
E. N. Kaufmann, D. E. Aspnes, J. W. Rodgers, and A. A. Studna, "Dielectric function measurements on ion-implanted metallic systems," J. Opt. Soc. Am. 67, 1099-1101 (1977)
http://www.opticsinfobase.org/josa/abstract.cfm?URI=josa-67-8-1099
You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
« Previous Article | Next Article »
OSA is a member of 