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Journal of the Optical Society of America

Journal of the Optical Society of America

  • Vol. 69, Iss. 5 — May. 1, 1979
  • pp: 738–742

Opto-galvanic spectroscopy in a uranium hollow cathode discharge

R. A. Keller, R. Engleman, Jr., and E. F. Zalewski  »View Author Affiliations


JOSA, Vol. 69, Issue 5, pp. 738-742 (1979)
http://dx.doi.org/10.1364/JOSA.69.000738


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Abstract

Laser induced impedance changes in a hollow cathode discharge containing sputtered uranium atoms were used for standard spectroscopic measurements, the determination of oscillator strengths, the measurement of the electron temperature of the discharge, isotope ratio analysis, and obtaining information about the sputtering process. Concentrations of uranium atoms as small as 108/cc could be detected.

© 1979 Optical Society of America

Citation
R. A. Keller, R. Engleman, Jr., and E. F. Zalewski, "Opto-galvanic spectroscopy in a uranium hollow cathode discharge," J. Opt. Soc. Am. 69, 738-742 (1979)
http://www.opticsinfobase.org/josa/abstract.cfm?URI=josa-69-5-738


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References

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  14. J. M. Gagné, B. Mongeau, B. Leblane, J. P. Saint-Dizier, P. Pianarosa, and L. Bertrand, "Production de Vapeur D'Uranium par Pulvérisation Cathodique dans une Cathode Creuse: Efficacités Relatives des Gaz Ne, Ar, Kr et Concentration á L'Etat 5 L06," Appl. Opt. 17, 2507 (1978).

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