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Journal of the Optical Society of America

Journal of the Optical Society of America

  • Vol. 70, Iss. 1 — Jan. 1, 1980
  • pp: 110–117

Image formation in photosensitive layers on top of highly conductive substrates

H. A. M. van den Berg and V. Zieren  »View Author Affiliations

JOSA, Vol. 70, Issue 1, pp. 110-117 (1980)

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The distribution of the average electric energy density defines which part of an exposed photosensitive resist layer is affected by the light beam. The image, which is formed by using optical projection systems, cannot be described by the standard Fresnel-Kirchhoff theory if highly reflective substrates are used. The theory has to take full account of the vectorial character of the light that accomplishes the exposure of the resist. It is shown that, even when objectives with a high numerical aperture are used, the standing wave effects will strongly affect the image. Especially in the region very close to the metal-resist interface, large deviations from scalar diffraction theory have been observed. These conclusions are supported by experimental evidence. The relevance of the theory is discussed by considering the consequences for the realization of microelectronic circuits.

© 1980 Optical Society of America

H. A. M. van den Berg and V. Zieren, "Image formation in photosensitive layers on top of highly conductive substrates," J. Opt. Soc. Am. 70, 110-117 (1980)

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  1. S. Middelhoek, "Projection masking, thin photoresist layers and interference effects," IBM J. Res. Dev. 14, 117–124 (1970).
  2. H. A. M. van den Berg, R. F. Humphreys, J. J. M. Ruigrok, and A. Venema, "Submicron IDT fabrication," Proc. Ultrason. Symp. 77CH, 767–769 (1977).
  3. H. I. Smith, N. Efremov, and P. L. Kelley, "Photolithographic contact printing of 4000 Å linewidth patterns," J. Electrochem. Soc. 21, 1503–1506 (1974).
  4. B. J. Lin, "Deep-UV conformable-contact photolithography for bubble circuits," IBM J. Res. Dev. 20, 213–221 (1976).
  5. A. N. Broers, "A review of high-resolution microfabrication techniques," Proc. 7th Essderc Brighton, 1977, pp. 155–177.
  6. H. I. Smith, "Fabrication techniques for surface-acoustic wave and thin-film optical devices," Proc. IEEE 62, 1361–1382 (1974).
  7. W. G. Heitman and P. M. van den Berg, "Diffraction of Electromagnetic Waves by a Semi-infinite Screen in a layered Medium," Can. J. Phys. 53, 1305–1317 (1975).
  8. Private communication between B. J. Lin and P. M. van den Berg.
  9. A. R. Neureuther and F. H. Dill, "Photoresist modeling and device fabrication applications," Proc. Opt. Acoust. Microelectron. 23, 233–249 (1974).
  10. D. W. Widmann, "Quantitative evaluation of photoresist patterns in the 1-µm range," Appl. Opt. 14, 931–934 (1975).
  11. H. A. M. van den Berg and J. J. M. Ruigrok, "Theory and practice of image formation by the photoprojection method of submicron patterns," Appl. Phys. 16, 279–287 (1978).
  12. P. S. Considine, "Effects of coherence on imaging systems," J. Opt. Soc. Am. 56, 1001–1009 (1966).
  13. S. H. Rowe, "Light distribution in the defocussed image of a co-herently illuminated edge," J. Opt. Soc. Am. 59, 711–714 (1969).
  14. E. Wolf, "Electromagnetic diffraction in optical systems.I. An integral representation of the image field," Proc. R. Soc. London Ser. A 253, 349–357 (1959).
  15. B. Richards and E. Wolf, "Electromagnetic diffraction in optical systems. II. Structures of the image field in an aplanatic system," Proc. R. Soc. London Ser. A 253, 358–379 (1959).
  16. A. Bouvin, J. Dow, and E. Wolf, "Energy flow in the neighborhood of the focus of a coherent beam," J. Opt. Soc. Am. 57, 1171–1175 (1967).
  17. J. H. Schuëtze and K. E. Hennings, "Micron and submicron patterns for semiconductor devices and integrated circuits," S.C.P. and Solid State Technol. 9, 31–39 (1966).
  18. M. Born and E. Wolf, Principles of Optics, 5th ed. (Pergamon, Oxford, 1975).
  19. R. E. Swing and J. R. Clay, "Ambiguity of the transfer function with partially coherent illumination," J. Opt. Soc. Am. 57, 1180–1189 (1967).
  20. R. I. Frank and W. L. Moberg, "Optical properties of reactively evaporated chromium oxide films," J. Vac. Sci. Technol. 4, 133–134 (1967).
  21. L. J. Maissal and R. Clang, Handbook of Thin Film Technology (McGraw-Hill, New York, 1970), p. 736.
  22. R. F. Millard, "The diffraction of an electromagnetic wave by a circular aperture," Monograph, 196R, 1–9 (1956).
  23. H. A. M. van den Berg and J. B. van Staden, "Antireflection coatings on metal layers for photolithographic purposes," J. Appl. Phys. 50, 1212–1214 (1979).

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