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Journal of the Optical Society of America

Journal of the Optical Society of America

  • Vol. 71, Iss. 6 — Jun. 1, 1981
  • pp: 737–743

Projection photolithography by wave-front conjugation

M. D. Levenson, K. M. Johnson, V. C. Hanchett, and K. Chiang  »View Author Affiliations


JOSA, Vol. 71, Issue 6, pp. 737-743 (1981)
http://dx.doi.org/10.1364/JOSA.71.000737


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Abstract

Conjugate wave-front generation by degenerate four-wave mixing has been employed to project images with submicrometer features onto photoresist-coated substrates. The developed patterns demonstrate a resolution of >800 line pairs per millimeter for 413-nm illumination, consistent with theoretical expectations. The patterns are not degraded by speckle or edge enhancement, and the magnification is within 0.1% of unity. Focusing is accomplished by a novel interferometric procedure.

© 1981 Optical Society of America

Citation
M. D. Levenson, K. M. Johnson, V. C. Hanchett, and K. Chiang, "Projection photolithography by wave-front conjugation," J. Opt. Soc. Am. 71, 737-743 (1981)
http://www.opticsinfobase.org/josa/abstract.cfm?URI=josa-71-6-737

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